Organic- Inorganic Hybrid Materials by ALD

Nilsen, Ola; Klepper, Karina Barnholt; Nielsen, Heidi; Fjellvaag, H.

doi:10.1149/ma2008-02/24/1877

Cited by 2 publications

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“…[13][14][15][16][17][18] Recently, a combination of ALD and MLD approaches has been used to deposit several examples of hybrid organic-inorganic thin films, including compounds of aluminum, silicon, titanium, and others. [19][20][21][22] Some organic-inorganic hybrid materials are referred to as coordination polymers, or metal-organic framework solids, built up of repeating metal-ligand-metal (M-L-M) connectivity, 23 where the L denotes a functional organic ligand, commonly containing C-O units linking to the metal center. Molecular layer deposition can also result in formation of planar or three-dimensional extended inorganic hybrid materials 21 with continuous metal-oxygen-metal (M-O-M) binding units.…”

Section: Introductionmentioning

confidence: 99%

“…Advances in chemical synthesis and thin film processing techniques are opening new approaches to prepare functional materials with well-defined composition, uniformity, and conformality. Atomic layer deposition (ALD), − for example, employing a repeated binary sequence of self-limiting monolayer deposition reactions, has been applied to a variety of inorganic metals and metal compounds for advanced electronic and optical applications. − Molecular layer deposition (MLD) expands upon the chemical concepts of ALD to integrate organic monomer and molecular building blocks into oligomeric and polymeric thin film structures with precise control of film thickness. − Recently, a combination of ALD and MLD approaches has been used to deposit several examples of hybrid organic−inorganic thin films, including compounds of aluminum, silicon, titanium, and others. − Some organic−inorganic hybrid materials are referred to as coordination polymers, or metal-organic framework solids, built up of repeating metal−ligand−metal (M−L−M) connectivity, where the L denotes a functional organic ligand, commonly containing C−O units linking to the metal center. Molecular layer deposition can also result in formation of planar or three-dimensional extended inorganic hybrid materials with continuous metal−oxygen−metal (M−O−M) binding units .…”

Section: Introductionmentioning

confidence: 99%

“…Vapor-phase molecular layer deposition has recently been investigated to form poly (aluminum ethylene glycol) materials , of the form (−O−Al−O−R−) n . These alkyl-aluminum oxide network solids are known as “alucone” polymers, ,, and were initially formed as preceramic polymers using solution-based sol−gel reaction processes.…”

Section: Introductionmentioning

confidence: 99%

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“Zincone” Zinc Oxide−Organic Hybrid Polymer Thin Films Formed by Molecular Layer Deposition

et al. 2009

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Hybrid organic-inorganic polymer thin films of the form (-O-Zn-O-C 2 H 4 -) n have been deposited from diethyl zinc and ethylene glycol using molecular layer deposition (MLD) over a range of substrate temperatures between 100 and 170 °C. Infrared transmission confirms that the films consist of Zn-O and ethylene-oxide units. In analogy with known alucone polymers of the form (-O-Al-O-R-) n , the zinc-based hybrid material is an example of a "zincone" polymer. In situ quartz crystal microbalance analysis indicated that the sequential surface reactions of diethyl zinc and ethylene glycol are sufficiently self-limiting and saturating to enable well-controlled MLD growth. Quantitative analysis of in situ quartz crystal microbalance and film thickness results indicate that ethylene glycol molecules can undergo a "double reaction" where the OH groups on both ends of the diol react with available Zn-C 2 H 5 surface sites to produce a relatively inert bridging alkane. The mass uptake per MLD cycle during Zn-hybrid film deposition decreases with increasing reaction temperature. Infrared transmission spectroscopy also shows that Zn-organic hybrid films are stable in dry air. However, the as-deposited ZnO-hybrid material could be hydrolyzed by H 2 O (for example, in ambient) resulting in films consisting of zinc oxide and zinc hydroxide with some carbon remnants. Spectroscopic ellipsometry indicates the thickness of hydrolyzed films increases linearly with reaction cycles, and scanning probe and transmission electron microscopy images show the hydrolyzed ZnO-hybrid film coating is uniform and conformal. The transmission electron micrographs also show the hydrolyzed Zn-hybrid films contain nanoscale porosity. These results suggest new pathways to fabricate organic-inorganic hybrid materials, including metalorganic framework structures.

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Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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“Zincone” Zinc Oxide−Organic Hybrid Polymer Thin Films Formed by Molecular Layer Deposition

et al. 2009

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“…The present text describes how the ALD technique can be applied for synthesis of thin films of the organic-inorganic hybrid type of materials. The first reference to deposition of such materials by the ALD technique was given in 2006 (16)(17)(18), where subsequent examples have thereafter been presented (19,20).…”

Section: Introductionmentioning

confidence: 99%

Deposition of Organic- Inorganic Hybrid Materials by Atomic Layer Deposition

et al. 2008

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The atomic layer deposition (ALD) technique has proved to be very suitable for deposition of thin films of organic-inorganic hybrid type of materials. This class of materials combines the rigid structures and physical properties of inorganic materials with the flexibility and physicochemical properties of organic compounds. The ALD growth of these nanostructured hybrid films is enabled by the use of highly reactive inorganic precursors and particular organic building units that can bond to the inorganic component via functional groups such as alcohols, carboxylic acids, amines, etc. The ALD technique enables design of such materials, constructed from a variety of inorganic and organic building units, at a resolution of one monolayer. This represents a major step forward with respect to nanostructured hybrid materials. Compared to the growth rate of purely inorganic materials by ALD, the growth rates for hybrid materials are much larger, and deposition rates as high as 4.4 nm/cycle has been demonstrated, thus enabling rapid depositions.

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Organic- Inorganic Hybrid Materials by ALD

Abstract: not Available.

Cited by 2 publications

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“Zincone” Zinc Oxide−Organic Hybrid Polymer Thin Films Formed by Molecular Layer Deposition

“Zincone” Zinc Oxide−Organic Hybrid Polymer Thin Films Formed by Molecular Layer Deposition

Deposition of Organic- Inorganic Hybrid Materials by Atomic Layer Deposition

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