2008
DOI: 10.1149/1.2979975
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Deposition of Organic- Inorganic Hybrid Materials by Atomic Layer Deposition

Abstract: The atomic layer deposition (ALD) technique has proved to be very suitable for deposition of thin films of organic-inorganic hybrid type of materials. This class of materials combines the rigid structures and physical properties of inorganic materials with the flexibility and physicochemical properties of organic compounds. The ALD growth of these nanostructured hybrid films is enabled by the use of highly reactive inorganic precursors and particular organic building units that can bond to the inorganic compon… Show more

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Cited by 81 publications
(93 citation statements)
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“…The results can be largely correlated to some previous reports. The MLD process using TMA and 4‐hydroquinone was successfully performed and studied at low temperatures . However, only one publication described the MLD process involving TMA and 4‐phenylenediamine, which works at 400 °C.…”
Section: Discussionmentioning
confidence: 99%
“…The results can be largely correlated to some previous reports. The MLD process using TMA and 4‐hydroquinone was successfully performed and studied at low temperatures . However, only one publication described the MLD process involving TMA and 4‐phenylenediamine, which works at 400 °C.…”
Section: Discussionmentioning
confidence: 99%
“…[24,25] In combination with the ALD fabrication of inorganic materials, a very convenient and highly controllable route to nanostructuring is molecular layer deposition (MLD) to produce hybrid inorganic-organic materials (Figure 1d). [26][27][28][29][30][31][32] The combined ALD/MLD technique has been used to fabricate various nanoscale oxide-organic superlattices in a highly controllable fashion [33] and crystalline ZnO-organic superlattices fabricated using hydroquinone (HQ, benzene-1,4-diol, HOC 6 H 4 OH) as the organic precursor indeed show orderof-magnitude reduction of thermal conductivity. [34] The orderof-magnitude reduction of thermal conductivity has also been proven for analogous hybrid TiO 2 -organic superlattices fabricated by ALD/MLD, highlighting the wider applicability of the oxide-organic superlattice approach for the thermal engineering of metal oxides.…”
Section: Wileyonlinelibrarycommentioning
confidence: 99%
“…In the present work, we investigate the impact of regular versus irregular/disordered layer arrangements in inorganic–organic hybrid thin films taking the advantage of the ALD/MLD technique for layer engineering. The ALD/MLD technique is uniquely suited for engineering these types of carefully designed structures, because its self‐limiting gas‐surface reactions enable atomic/molecular level film growth control . We chose the ZnO/benzene system as our model system because (i) in ZnO heat conduction is dominated by phonons rather than by charge carriers, (ii) the ALD/MLD process for ZnO/benzene thin films is already established allowing the fabrication of the films in a highly controlled manner, and (iii) in these superlattices the phonon mean free path is of the relevant length .…”
Section: Introductionmentioning
confidence: 99%