Ordered nanocrystals on argon ion sputtered polymer film

Wei, Qiangmin; Lian, Jie; Zhu, Sha; Li, Weixing; Sun, Kai

doi:10.1016/j.cplett.2007.12.053

Cited by 33 publications

(32 citation statements)

References 22 publications

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“…For applications of materials where surface morphologies play crucial roles, insights about various effects of ion-beam irradiations are extremely important. Surface patterns vis-à-vis morphologies formed by low energy ion irradiations have been investigated on variety of materials for special applications [2][3][4][5][6]. Formation, growth of patterns and characteristics of surface ripples have been primarily described as a result of competitions between curvature dependent surface instability induced by ion-beam sputtering and surface relaxation processes [7].…”

Section: Introductionmentioning

confidence: 99%

High energy ion irradiation induced surface patterning on a SiO 2 glass substrate

Srivastava

Ganesan

Gangopadhyay

et al. 2014

Nuclear Instruments and Methods in Physics Research Section B:

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Section: Introductionmentioning

confidence: 99%

High energy ion irradiation induced surface patterning on a SiO 2 glass substrate

Srivastava

Ganesan

Gangopadhyay

et al. 2014

Nuclear Instruments and Methods in Physics Research Section B:

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“…[3][4][5][6] Ion-induced ripple patterns have been observed on a large variety of different materials including single 7 as well as polycrystalline metals, 8 various semiconductors, [9][10][11] oxides, 12,13 ionic crystals, 14,15 and even polymers. 16 The periodicity of these ripples can be tuned in the range from around ten up to several hundred nanometers by varying the energy of the incident ions. 17 Thus, low-energy ion sputtering represents a simple and cost-effective way for the fabrication of large-area nanopatterned surfaces for various applications.…”

Section: Introductionmentioning

confidence: 99%

Tuning the quality of nanoscale ripple patterns by sequential ion-beam sputtering

Keller

Facsko

2010

Phys. Rev. B

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It is demonstrated that the quality of nanoscale ripple patterns on silicon surfaces can be substantially improved by applying sequential ion-beam sputtering. A flat silicon surface is sputtered at an intermediate incident angle which leads to the spontaneous formation of a periodic ripple pattern with 25 nm periodicity oriented normal to the direction of the incident ion beam. After rotating the sample by an azimuthal angle of 90°, the surface is sputtered parallel to the ripples under grazing incidence. At the low fluences applied in this second step, no ripple pattern oriented parallel to the ion beam forms. However, due to geometrical shadowing and preferential erosion of pattern defects, grazing incidence sputtering enhances the order and regularity of the ripple pattern. The quality of the ripple pattern is assessed by evaluating its normalized density of topological defects which is determined from atomic force microscopy images. During grazing incidence ion sputtering, the normalized defect density is found to decrease exponentially with the applied ion fluence. It is shown that in this way the defect density of the initial ripple pattern can be reduced by at least 40% while keeping its periodicity approximately constant. Numerical integrations of the Kuramoto-Sivashinsky equation are in good qualitative agreement with the experimental results and suggest that the observed reduction in the density of pattern defects during sequential ion-beam sputtering is a universal effect present in a large variety of experimental systems.

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“…On the one hand, observations of periodic patterns including highaspect ratio quantum dots 3 , with occasional long-range order 4 and characteristic spacing, as small as 7 nm (ref. 5), have stimulated interest in self-organized pattern formation as a means of sub-lithographic nanofabrication 6 . On the other hand, extended exposure to energetic particle irradiation can lead to the structural degradation of fission and fusion reactor components 7,8 .…”

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confidence: 99%

Molecular dynamics of single-particle impacts predicts phase diagrams for large scale pattern formation

et al. 2011

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Energetic particle irradiation can cause surface ultra-smoothening, self-organized nanoscale pattern formation or degradation of the structural integrity of nuclear reactor components. A fundamental understanding of the mechanisms governing the selection among these outcomes has been elusive. Here we predict the mechanism governing the transition from pattern formation to flatness using only parameter-free molecular dynamics simulations of single-ion impacts as input into a multiscale analysis, obtaining good agreement with experiment. our results overturn the paradigm attributing these phenomena to the removal of target atoms via sputter erosion: the mechanism dominating both stability and instability is the impact-induced redistribution of target atoms that are not sputtered away, with erosive effects being essentially irrelevant. We discuss the potential implications for the formation of a mysterious nanoscale topography, leading to surface degradation, of tungsten plasma-facing fusion reactor walls. Consideration of impact-induced redistribution processes may lead to a new design criterion for stability under irradiation.

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Ordered nanocrystals on argon ion sputtered polymer film

Cited by 33 publications

References 22 publications

High energy ion irradiation induced surface patterning on a SiO 2 glass substrate

High energy ion irradiation induced surface patterning on a SiO 2 glass substrate

Tuning the quality of nanoscale ripple patterns by sequential ion-beam sputtering

Molecular dynamics of single-particle impacts predicts phase diagrams for large scale pattern formation

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