High energy ion irradiation induced surface patterning on a SiO 2 glass substrate

Srivastava, Sachin; Ganesan, K.; Gangopadhyay, P.; Panigrahi, B. K.; Nair, K.G.M.; Tyagi, A.K.

doi:10.1016/j.nimb.2014.08.003

Cited by 12 publications

(8 citation statements)

References 33 publications

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“…Most of the studies of ion-induced ripple formation have been performed at low (<10 keV) and medium (10-500 keV) energies [9,10,12]. However, studies of pattern formation at higher energies, limited to a few case studies of targeted at micrometer sized structures [13,14], while other focus their attention on the stress generated by MeV irradiation [15,16] trying to bridge the gap between microscopic and macroscopic phenomena.…”

Section: Introductionmentioning

confidence: 99%

Surface morphology of amorphous SiO₂ substrates bombarded with 1.0 MeV Si⁺ ions

García

Rickards

Gago

et al. 2018

J. Phys.: Condens. Matter

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Surface pattern formation on amorphous SiO substrates by implantation of 1.0 MeV Si ions at a current of 1.3 µA at 70° angle is reported. Surface micrometer sized ripples perpendicular to the ion beam direction are formed, observed by scanning electron microscopy and atomic force microscopy. The morphological features are more or less similar for different fluences. The formation of surface ripples at this energy is discussed in terms of ion stopping mechanisms and patterns obtained within the low- and medium-energy ranges.

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Section: Introductionmentioning

confidence: 99%

Surface morphology of amorphous SiO₂ substrates bombarded with 1.0 MeV Si⁺ ions

García

Rickards

Gago

et al. 2018

J. Phys.: Condens. Matter

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“…The emergence of surface patterns by ion beam irradiation (IBI) techniques is known to occur on a variety of materials including semiconductors [1][2][3], metals [4,5], and insulators [6][7][8], under a wide range of experimental conditions. Since its discovery by Cunningham et al [9] and Návez et al [10], this nano structuring process has drawn attention due to its potential uses in the surface functionalization of materials for applications in microfluidics [11,12], orthopedic implants [13][14][15], and solar cell manufacturing [16][17][18].…”

Section: Introductionmentioning

confidence: 99%

“…Other studies focus on their mechanical stability, including borosilicate-based glasses for radioactive waste disposal [32]. However, there are few studies on surface morphology changes and the patterns generated after ion implantation of glasses at energies of a few MeV [7,8,33,34].…”

Section: Introductionmentioning

confidence: 99%

“…For ion irradiation these two regions, surface processes generated by ion-atom interactions are those due to the slowing down of ions in the target material by ion-atom (nuclear collisions) and ion-electron (ionization) [28,42]. Further considerations at higher energies is possible, as there is evidence that similar processes occur near the surface at MeV energies [7,8,33,43,44]. Thus, pattern formation at surfaces focuses primarily in low to medium energy ion beams [39].…”

Section: Introductionmentioning

confidence: 99%

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Surface morphology and topography evolution of soda-lime silica glass after 1.0 MeV Si ion bombardment

Cruz-Garcia,

Rickards,

Garcia

et al. 2023

Phys. Scr.

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Surface pattern formation on soda-lime silica glass by 1 MeV Si ion irradiation impinging at an angle of 70o with respect to the surface normal has been studied. Modification of surfaces were analyzed for total ion fluences applied between 1×10^17 up to 4×10^17 ions/cm2. The surface morphology and topography were studied by scanning electron microscopy (SEM), and atomic force microscopy (AFM). These surface techniques enabled the determination of roughness, characteristic wavelengths, and correlation lengths. In addition, electron dispersive spectroscopy (EDS) scans were applied on the surface topography to study the variation of the Si content on the obtained surface patterns. From the measurement of these variables, linear and non-linear regimes were established. At linear regime, the surface morphology develops from an initial flat surface giving rise to ripples for fluences up to 1.4×10^17 ions/cm2. As the ion bombardment continues surface evolve into wrinkles finalizing at cellular-like structures, growing under an anomalous scaling process. The EDS scans indicate the presence of shadowing effects. The morphological changes observed can be explained in terms of a combination of thermal mass diffusion and geometrical factors during ion irradiation, including shadowing and subsequent (secondary) surface erosion effects adapted to few MeV energies.

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“…Studies show that the ion beam resistance capability of MGs is much improved over corresponding crystalline counterparts and even traditional radiation resistance materials [10,11]. As an effective means for surface smoothing and pattern formation, ion beam irradiation has been widely used on amorphous materials, such as ␣-Si, ␣-SiO 2 and ␣-C films [12][13][14]. Most theories [15][16][17] describing the evolution of surface morphologies involve a competition between smoothing mechanisms, such as surface diffusion or viscous flow, and roughening mechanisms, such as sputtering or deposition.…”

Section: Introductionmentioning

confidence: 99%

Viscous surface flow induced on Ti-based bulk metallic glass by heavy ion irradiation

Zhang

et al. 2016

Applied Surface Science

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a b s t r a c tTi-based bulk metallic glass was irradiated by a 20 MeV Cl 4+ ion beam under liquid-nitrogen cooling, which produced remarkable surface smoothing and roughening that respectively correspond to normal and off-normal incidence angles of irradiation. Atomic force microscopy confirms two types of periodic ripples distributed evenly over the rough glass surface. In terms of mechanism, irradiation-induced viscosity agrees with the theoretical prediction for metallic glasses near glass transition temperature. Here, a model is introduced, based on relaxation of confined viscous flow with a thin liquid-like layer, that explains both surface smoothing and ripple formation. This study demonstrates that bulk metallic glass has high morphological instability and low viscosity under ion irradiation, which assets can pave new paths for metallic glass applications.

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High energy ion irradiation induced surface patterning on a SiO 2 glass substrate

Cited by 12 publications

References 33 publications

Surface morphology of amorphous SiO₂ substrates bombarded with 1.0 MeV Si⁺ ions

Surface morphology of amorphous SiO₂ substrates bombarded with 1.0 MeV Si⁺ ions

Surface morphology and topography evolution of soda-lime silica glass after 1.0 MeV Si ion bombardment

Viscous surface flow induced on Ti-based bulk metallic glass by heavy ion irradiation

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High energy ion irradiation induced surface patterning on a SiO 2 glass substrate

Cited by 12 publications

References 33 publications

Surface morphology of amorphous SiO2 substrates bombarded with 1.0 MeV Si+ ions

Surface morphology of amorphous SiO2 substrates bombarded with 1.0 MeV Si+ ions

Surface morphology and topography evolution of soda-lime silica glass after 1.0 MeV Si ion bombardment

Viscous surface flow induced on Ti-based bulk metallic glass by heavy ion irradiation

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Surface morphology of amorphous SiO₂ substrates bombarded with 1.0 MeV Si⁺ ions

Surface morphology of amorphous SiO₂ substrates bombarded with 1.0 MeV Si⁺ ions