1999
DOI: 10.1109/6104.778172
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Optimization of via formation in photosensitive dielectric layers using neural networks and genetic algorithms

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Cited by 17 publications
(1 citation statement)
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“…Optimum solutions for plasma processing have been found using the genetic algorithm (GA) approach, in conjunction with neural network-based models of plasma behaviour [9]. We have previously demonstrated the advantages of artificial intelligence (AI) for controlling plasma processes, including the use of fuzzy logic for controlling DC bias, but process optimization was not attempted at that stage [10].…”
Section: Introduction and Strategymentioning
confidence: 99%
“…Optimum solutions for plasma processing have been found using the genetic algorithm (GA) approach, in conjunction with neural network-based models of plasma behaviour [9]. We have previously demonstrated the advantages of artificial intelligence (AI) for controlling plasma processes, including the use of fuzzy logic for controlling DC bias, but process optimization was not attempted at that stage [10].…”
Section: Introduction and Strategymentioning
confidence: 99%