Abstract:Anisotropic wet etching of vicinal monocrystalline Si (111)4o wafers was used to obtain blazed gratings that are highly efficient in the soft X-ray (SXR) and extreme ultraviolet (EUV) applications. An improved experimental technology for the fabrication of triangular-grooved Si gratings, both medium-frequency (250 and 500 mm-1) and high-frequency (2500 mm-1) ones, is presented. The stages of forming a Cr-mask for grooves etching, removing Si nubs in order to smooth the profile, and polishing the surface to red… Show more
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