2019
DOI: 10.1016/j.jallcom.2018.09.230
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Optimization of the growth temperature of α-Ga2O3 epilayers grown by halide vapor phase epitaxy

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Cited by 45 publications
(39 citation statements)
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“…1(d). Within each individual domain, the atomic steps are straight and elongated along the [11][12][13][14][15][16][17][18][19][20] and no surface depressions within the terraces are observed. Existing theories developed for dislocation mediated surface morphologies have been employed to interpret the formation of pinned steps, spiral growth hillocks, and surface depression.…”
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confidence: 99%
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“…1(d). Within each individual domain, the atomic steps are straight and elongated along the [11][12][13][14][15][16][17][18][19][20] and no surface depressions within the terraces are observed. Existing theories developed for dislocation mediated surface morphologies have been employed to interpret the formation of pinned steps, spiral growth hillocks, and surface depression.…”
mentioning
confidence: 99%
“…In recent years, high quality a-Ga 2 O 3 epilayers and heterostructures have been realized on sapphire substrates by mist-CVD 6 and halide vapor phase epitaxy (HVPE). [10][11][12] Consequently, vertical Schottky diodes with a low on-resistance of 0.4 mX cm 2 and a breakdown voltage of 855 V have been reported. 13 Due to the large in-plane lattice mismatch of about 4.81%, a-Ga 2 O 3 epilayers deposited on sapphire substrates typically result in a high density of dislocations of the order of 10 10 cm À2 .…”
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