Optimization of a Recessed LOCOS using a tuned 2-D process simulator

Carnevale, G.; Colpani, P.; Marmiroli, A.; Rebora, A.; Tixier, Aude

doi:10.1007/978-3-7091-6619-2_69

Cited by 2 publications

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“…That model incorporates simplified versions of shadowing effects and scattering in the plasma sheath. The components of the flux vector, for etching of an infinite trench, are given at any point by (18) (19) Here, the integral is taken over , which is the solid angle over which the plasma is visible. The function is the flux of particles moving with angle to the local vertical, and is the average energy of those particles.…”

Section: Example: a Reactive Ion Etch Modelmentioning

confidence: 99%

“…The values may be selected based on surface evolution data taken from scanning electron micrographs of feature cross-sections. For the most part, this calibration process is ad hoc, and relies heavily on the modeler's expert knowledge of the system; for examples, see [18] and [48]. To our knowledge, only one study has investigated methods to optimize this process systematically [14].…”

Section: Introductionmentioning

confidence: 99%

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Shape-based optimal estimation and design of curve evolution processes with application to plasma etching

Berg

Zhou

2001

IEEE Trans. Automat. Contr.

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This paper considers the problem of determining a finite number of discrete parameters appearing in a nonlinear partial differential equation describing a curve evolution process. The method is applied to the plasma etching of thin films for semiconductor manufacturing. Results are obtained within the mathematical framework of level set methods. Here, the evolution of the curve under study is captured through the evolution of a level set function. The underlying physics of the process are completely contained in a scalar function called the speed function. The degree of difficulty of treating the evolution equation depends on the functional dependencies of the speed function. This paper presents optimal estimation and design techniques based on analytical gradient computations for a class of position and orientation dependent speed functions. The technique is demonstrated on a plasma etching model taken from the literature. Only simulation results are presented here, but the model under study has been shown to reproduce experimental data with reasonable accuracy. In the estimation problem, parameters in the model are fit to best match the feature shape measured in experiments. In the optimal design problem, parameter values are selected to most closely attain a desired feature shape.

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Section: Example: a Reactive Ion Etch Modelmentioning

confidence: 99%