The dielectric–semiconductor interface plays a
critical
role in determining the performance of organic field-effect transistors
(OFETs) as the first few layers of the semiconductor actively participate
in charge transportation. Several methods, such as self-assembled
monolayer deposition, plasma treatment, and UV–ozone (UVO)
treatment, have been explored to modify the dielectric surface and
enhance the OFET performance. Although the effect of UVO treatment
on OFET characteristics has been investigated in past few reports,
the influence on photoresponses still remains unexplored. This study
proposes an efficient approach to enhance photoresponses in dinaphtho[2,3-b:2′,3′-f]thieno[3,2-b]thiophene (DNTT)-based OFETs through UVO treatment of
the poly(methyl methacrylate) (PMMA) surface. UVO-treated devices
exhibit notable enhancement in drain-to-source current (I
D) under dark conditions and improved photoresponses under
white light illumination. The photosensitivity increases from 2.26
× 105 to 6.65 × 106, whereas detectivity
improves from 1.09 × 109 to 1.98 × 1014 Jones after 10 min of UVO treatment. Furthermore, the responsivity
increases from 1.48 × 103 to 4.33 × 105 A/W at a low intensity of 5 μW/cm2. The decrease
in the water contact angle after UVO treatment indicates higher hydrophilicity
of the PMMA surface, which in turn leads to better growth of DNTT
molecules, further confirmed by atomic force microscopy (AFM) and
grazing incidence X-ray diffraction (GIXRD). X-ray photoelectron spectroscopy
(XPS) analysis indicates the generation of polar functional groups
on the PMMA surface serving as electron acceptor sites. These sites
enhance the effective hole concentration by trapping photoinduced
electrons at the dielectric–semiconductor interface, resulting
in improved photoresponses. Our findings, thus, demonstrate the potential
of UVO treatment as a facile yet efficient route to enhance the photosensing
performance of OFETs.