1998
DOI: 10.1016/s0022-3093(98)00720-0
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Optically active oxygen-deficiency-related centers in amorphous silicon dioxide

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Cited by 1,224 publications
(1,146 citation statements)
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References 134 publications
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“…For instance, S and Te may react with O atoms in ZSM-5, producing defects, which have similar structures to the so-called oxygen-deficient center in SiO 2 [35], which is known to provide an absorption and PL peak at ~2.8 eV.…”
Section: Discussionmentioning
confidence: 99%
“…For instance, S and Te may react with O atoms in ZSM-5, producing defects, which have similar structures to the so-called oxygen-deficient center in SiO 2 [35], which is known to provide an absorption and PL peak at ~2.8 eV.…”
Section: Discussionmentioning
confidence: 99%
“…1,2 Hole trapping in silica has been relatively well understood with the models of self-trapped holes [3][4][5][6] and several hole trapping defects well established. [7][8][9] However, identifying sites responsible for electron trapping in silica, bulk and surface, has proved particularly challenging. This is because of a large number of possible charge redistribution channels and presence of water and impurities in most samples.…”
Section: Introductionmentioning
confidence: 99%
“…Our previous investigation has shown that there could be even more types of oxygen-deficient centers contributing to 2.7-3.2 eV and 4.2-4.5 eV PL [14]. The second approach ascribes them to twofold silicon and germanium atoms respectively [6,15,16]. Moreover, in the present case we cannot confidently propose germanium-related models of ODCs as Ge atoms were not deliberately introduced into silica matrix.…”
Section: Discussionmentioning
confidence: 57%
“…1. The non-elementary 4.5 eV PL band corresponding to the singlet luminescence of a-ODC (4.3 eV) and b-ODC (4.5 eV) [6], as well as an unidentified peak near 3.6 eV are observed under 5.1 eV excitation. The growth of the luminescence intensity near 3.1 eV is assumed to be due to the presence of the ODC triplet radiation.…”
Section: Resultsmentioning
confidence: 97%
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