Ion Implantation 2012
DOI: 10.5772/35265
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Optical Waveguides Fabricated by Ion Implantation/Irradiation: A Review Optical Waveguides Fabricated by Ion Implantation/Irradiation: A Review

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Cited by 11 publications
(5 citation statements)
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References 233 publications
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“…Ion irradiation has been extensively studied for the fabrication and modification of materials and nanostructures and is an industrial method in mainstream microelectronics industries. Amongst the many applications, an example is the use of swift heavy ions (SHIs) for the formation of optical waveguides in insulating materials, such as amorphous SiO 2 and Si 3 N 4 , as detrimental effects are significantly reduced in comparison to low-energy ion implantation [1]. At high ion energies, processes are predominantly based on the interaction of the ions with the electrons in the material as the interaction cross-section for nuclear collisions dramatically decreases with increasing ion energy.…”
Section: Introductionmentioning
confidence: 99%
“…Ion irradiation has been extensively studied for the fabrication and modification of materials and nanostructures and is an industrial method in mainstream microelectronics industries. Amongst the many applications, an example is the use of swift heavy ions (SHIs) for the formation of optical waveguides in insulating materials, such as amorphous SiO 2 and Si 3 N 4 , as detrimental effects are significantly reduced in comparison to low-energy ion implantation [1]. At high ion energies, processes are predominantly based on the interaction of the ions with the electrons in the material as the interaction cross-section for nuclear collisions dramatically decreases with increasing ion energy.…”
Section: Introductionmentioning
confidence: 99%
“…Initial irradiation with 3 Â 10 14 ions=cm 2 12 MeV carbon ions/cm 2 produces two regions of damage, namely, a heavy damaged region due to the interaction between the carbon ions and the electron cloud of the crystal (electronic damage), and a damaged region further into the crystal due to the ballistic interaction between the ions and the atoms in the crystal (nuclear damage). 16 In the particular case of this work, the electronic interaction, given by the stopping force, is two orders of magnitude higher than the nuclear damage (see Fig. 1), and no significant contribution of the nuclear damage has been found in previous research.…”
Section: A After Irradiationmentioning
confidence: 45%
“…Material structure and performance can be enhanced or degraded through the reorganization of surfaces, the implantation of chemical species, or the creation of defects depending on the ion species, energy, angle, etc., leading to sputtering, 1,2 accumulation of defects, phase changes, 3 morphological changes, surface structures, 4,5 inducing nanostructures on polymers, 6 semiconductors, 7 and metals. 8 Ion beams can also be used for implantation, 9 waveguide formation, 10 functionalization of interfaces and surfaces, or emulation of exposure to extreme radiation environments, such as outer space or nuclear reactors. [11][12][13][14] Post-irradiation examination (PIE) is typically conducted to examine the impact of irradiation on materials.…”
Section: Introductionmentioning
confidence: 99%