OPTICAL VIBRATIONAL AND MORPHOLOGICAL PROPERTIES OF S-Co3O4 NANOSTRUCTURED THIN FILM

Abstract

Sulphur doped Co3O4 (S-Co3O4) nanostructured thin film has been deposited on glass substrate. The film has been characterized by X-ray diffraction (XRD), energy-dispersive X-ray spectroscopy (EDS), Fourier transform infrared (FTIR) and Raman spectroscopy. The surface appearance of the film was obtained using scanning electron microscopy (SEM) and atomic force microscopy (AFM). A double beam spectrophotometer equipped with an integrating sphere was used to measure the transmittance and reflectance measurements. Refractive index, extinction coefficient, optical conductivity and dielectric constant of the film were calculated. The XRD pattern shows that the film has only clear diffraction peak around 2θ = 29.26 o corresponding to the (111) plane of cubic Co3O4. The crystallite size was calculated to be approximately 24 nm. The Raman measurement revealed four peaks of Co3O4. FTIR spectrum of the film has been investigated in 500-3000 cm −1 region.

Magnetron sputtering technique for analyzing the influence of RF sputtering power on microstructural surface morphology of aluminum thin films deposited on SiO2/Si substrates

“…Furthermore, the characteristic vibration at 937 cm −1 can be assigned to O-Si-O bond [38]. Besides, the absorption band at about 943 cm −1 can be associated with stretching mode of Si-OH [39]. The infrared absorption band at 1118 cm −1 is attributed to the tetrahedral stretching vibration of silicon-apical oxygen (Si-O) [40].…”