Optical Proximity Corrections for Digital Micromirror Device-based Maskless Lithography

Hur, Jun-Gyu; Seo, Manseung

doi:10.3807/josk.2012.16.3.221

Cited by 10 publications

(3 citation statements)

References 19 publications

(18 reference statements)

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“…However, as feature width decreases, the differences between closely spaced and less closely spaced shapes becomes apparent 28 . A number of parameters affect the magnitude of the OPE, including photoresist type, thickness of photoresist layer, wavelength of exposure light, exposure energy, numerical aperture, and illuminator settings 27 – 29 . As a consequence, the exact magnitude of OPE needs to be determined empirically and re-evaluated whenever changes in the process are implemented.…”

Section: Discussionmentioning

confidence: 99%

Effect of design geometry, exposure energy, cytophilic molecules, cell type and load in fabrication of single-cell arrays using micro-contact printing

Bhujbal¹,

Dekov²,

Ottesen³

et al. 2020

Sci Rep

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In this study a range of factors influencing the fabrication of single-cell arrays (SCAs) are identified and investigated. Micro-contact printing was used to introduce spots coated with polyethyleneimine or Matrigel on glass surfaces pre-coated with polyethylene glycol. Unmodified E. coli, Synechococcus sp., Chlamydomonas reinhardtii as well as diverse mammalian cells including HUVEC, AAV293, U87, OHS, PC3, SW480, HepG2 and AY-27 were successfully immobilised onto the chemically coated spots. The developed SCAs show high cell viability and probability for capturing single-cells. A discrepancy between the size and shape of the squares described in the design file and the actual structures obtained in the final PDMS structure is characterised and quantified. The discrepancy is found to be depending on the exposure energy used in the photolithography process as well as the size of the squares and their separation distance as detailed in the design file. In addition to these factors, the effect of the cell density loaded onto the patterned surfaces is also characterised. The systematic characterisation of key parameters that need to be optimised prior to the fabrication of SCAs is essential in order to increase the efficiency and reproducibility of future fabrication of SCAs for single-cell studies.

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Section: Discussionmentioning

confidence: 99%

Effect of design geometry, exposure energy, cytophilic molecules, cell type and load in fabrication of single-cell arrays using micro-contact printing

Bhujbal¹,

Dekov²,

Ottesen³

et al. 2020

Sci Rep

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show abstract

“…A DMD has the advantages of high contrast ratio and throughput and a wide dynamic control range [2]. Because of this, DMDs have been widely used in various applications such as projectors [3,4], confocal microscopes [5][6][7], and maskless lithography [8][9][10][11][12][13][14].…”

Section: Introductionmentioning

confidence: 99%

Detecting Digital Micromirror Device Malfunctions in High-throughput Maskless Lithography

Kang

Hahn

2013

Journal of the Optical Society of Korea

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Recently, maskless lithography (ML) systems have become popular in digital manufacturing technologies. To achieve high-throughput manufacturing processes, digital micromirror devices (DMD) in ML systems must be driven to their operational limits, often in harsh conditions. We propose an instrument and algorithm to detect DMD malfunctions to ensure perfect mask image transfer to the photoresist in ML systems. DMD malfunctions are caused by either bad DMD pixels or data transfer errors. We detect bad DMD pixels with 20×20 pixel by white and black image tests. To analyze data transfer errors at high frame rates, we monitor changes in the frame rate of a target DMD pixel driven by the input data with a set frame rate of up to 28000 frames per second (fps). For our data transfer error detection method, we verified that there are no data transfer errors in the test by confirming the agreement between the input frame rate and the output frame rate within the measurement accuracy of 1 fps.

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“…The edge detection is the most essential function of the CD measurements. The CD measurement is a vital inspection for LCDs [5][6] and semiconductors [7][8] to improve the production yield rate, there are numbers of techniques to measure the CD. So in this study, a new subpixel algorithm is developed through facet modeling, which complements the previous sub-pixel edge detection algorithm.…”

mentioning

confidence: 99%

In-line Critical Dimension Measurement System Development of LCD Pattern Proposed by Newly Developed Edge Detection Algorithm

Park¹,

Lee²,

Pahk³

2013

Journal of the Optical Society of Korea

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As the essential techniques for the CD (Critical Dimension) measurement of the LCD pattern, there are various modules such as an optics design, auto-focus [1][2][3][4], and precise edge detection. Since the operation of image enhancement to improve the CD measurement repeatability, a ring type of the reflected lighting optics is devised. It has a simpler structure than the transmission light optics, but it delivers the same output. The edge detection is the most essential function of the CD measurements. The CD measurement is a vital inspection for LCDs [5][6] and semiconductors [7][8] to improve the production yield rate, there are numbers of techniques to measure the CD. So in this study, a new subpixel algorithm is developed through facet modeling, which complements the previous sub-pixel edge detection algorithm. Currently this CD measurement system is being used in LCD manufacturing systems for repeatability of less than 30 nm.

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Optical Proximity Corrections for Digital Micromirror Device-based Maskless Lithography

Cited by 10 publications

References 19 publications

Effect of design geometry, exposure energy, cytophilic molecules, cell type and load in fabrication of single-cell arrays using micro-contact printing

Effect of design geometry, exposure energy, cytophilic molecules, cell type and load in fabrication of single-cell arrays using micro-contact printing

Detecting Digital Micromirror Device Malfunctions in High-throughput Maskless Lithography

In-line Critical Dimension Measurement System Development of LCD Pattern Proposed by Newly Developed Edge Detection Algorithm

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