“…With the use of tunnel junction, the resistive p -GaN contact layer can be replaced by an n -GaN contact, leading to significantly reduced device resistance, ,− voltage loss, and heating effect. , Tunnel junction also enables the stacking of multiple p – n junctions/LEDs, ,,− providing the unique opportunity of repeated carrier usage. ,, As such, high power operation can be achieved at low injection current, leading to enhanced efficiency and reduced efficiency droop. , Various design schemes, including GaN/Al(Ga)N/GaN, − , GaN/InGaN/GaN, ,,− and GaN/GdN/GaN , tunnel junctions have been implemented in GaN-based LED structures. However, the tunneling probability has been severely limited by the difficulty in creating a highly doped p -region. ,, Recently, it has been demonstrated that dopant incorporation can be significantly enhanced in nanowire structures, due to the much reduced formation energy in the near-surface region. − Moreover, compared to conventional GaN quantum well devices, GaN nanowire LEDs can exhibit significantly reduced dislocation densities and polarization fields. − Nanowire LEDs with tunable, multicolor emission have been demonstrated, which can be epitaxially grown on extremely low cost, large area Si substrates. ,− In spite of these intensive studies, the incorporation of tunnel junction in nanowire LEDs has not been reported to our knowledge.…”