Optical properties of electron-beam-evaporated TiO2 films

Ambient temperature growth of nanocrystalline titanium dioxide thin films

“…These are relatively lower than those reported for annealed sputtered films [8][9][10][11][12][13]. The low values of n observed in the present study may partly be due to low packing density, partial crystallinity of the films and low adatom mobility of the films at ambient temperature.…”

“…One of the challenges in all these applications is low-temperature processing of the nanocrystalline films since, some of the devices are based on hybrid organic-inorganic systems. The growth of TiO 2 films by conventional techniques such as evaporation and sputtering and the resulting optical, transport and structural properties are well documented [8][9][10][11][12][13][14][15][16][17][18]. However, there are very few studies that report on the possibility of ambient temperature growth of nanocrystalline titania thin films by these techniques.…”

Investigation on properties of TiO2 thin films deposited at different oxygen pressures

“…Many different procedures for the preparation of TiO 2 thin films are reported [1][2][3][4][5]. With all these deposition methods, TiO 2 films can be prepared with largely varying structural, mechanical and optical properties [6][7][8][9][10]. Thin film of TiO 2 is frequently used for optical coatings due to its high refractive index and high stability, and its properties are known to be easily affected by the deposition conditions such as the substrate temperature and oxygen partial pressure as well as the post-deposition heat-treatment.…”

Structural and optical investigations of TiO2 films deposited on transparent substrates by sol–gel technique

“…The preparation of TiO 2 thin films has received great attention during the past several decades because of its remarkable optical, photo-catalytical and electronic properties. TiO 2 films can be synthesized by various thin film deposition techniques, such as thermal evaporation [4,5], chemical vapor deposition (CVD) [6], metal organic chemical vapor deposition [7], * Corresponding author. Tel.…”