1994
DOI: 10.1063/1.111633
|View full text |Cite
|
Sign up to set email alerts
|

Optical near-field imaging with a semiconductor probe tip

Abstract: We present an optical near-field detection mechanism based on optical modulation of the image force between a semiconducting probe tip and a glass surface. The modulation stems from a phenomenon called surface photovoltage. The performance of the mechanism for near-field imaging is demonstrated by using a scanning force microscope over a standing evanescent light wave. The lateral resolution is found to be 170 nm (subwavelength) and a representative minimum detectable power is 0.1 pW/√Hz in air. We develop a s… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1

Citation Types

1
13
0
2

Year Published

1994
1994
2015
2015

Publication Types

Select...
7
3

Relationship

0
10

Authors

Journals

citations
Cited by 37 publications
(16 citation statements)
references
References 11 publications
1
13
0
2
Order By: Relevance
“…Having discussed the KFM in some detail, we conclude this section by brie¯y describing a different, interesting SPV-based application of the AFM. Mertz et al demonstrated that if the AFM tip material is a semiconductor, then illumination of the tip may change the electrical forces acting on it due to a change in its band-bending, just as in the case of illuminating a semiconductor sample discussed so far [275]. Thus, force measurement may be used as a local probe of illumination intensity incident on the tip and optical near ®eld imaging may be performed.…”
Section: Kelvin Probe Force Microscopymentioning
confidence: 99%
“…Having discussed the KFM in some detail, we conclude this section by brie¯y describing a different, interesting SPV-based application of the AFM. Mertz et al demonstrated that if the AFM tip material is a semiconductor, then illumination of the tip may change the electrical forces acting on it due to a change in its band-bending, just as in the case of illuminating a semiconductor sample discussed so far [275]. Thus, force measurement may be used as a local probe of illumination intensity incident on the tip and optical near ®eld imaging may be performed.…”
Section: Kelvin Probe Force Microscopymentioning
confidence: 99%
“…The change of decay time with the tip-sample distance falls off on a 1 µm length scale, in contrast to ~100 nm as predicted for the Purcell effect [16]. Approaching a blunt tip with an apex of 1 µm did not change the apparent lifetime, excluding an influence of the dielectric tip on the surface potential as a cause for the lifetime change [17]. A dielectric tip may open additional radiative channels in the emitter near-field by scattering, leading to a reduction of the radiative lifetime of up to 7% and a small dielectric artefact [18,19].…”
mentioning
confidence: 76%
“…To measure these properties locally, one of the plates is replaced by an AFM tip and the applied force as a function of applied external voltage between the tip and sample is measured [41]. This technique permits the measurement of local changes in the optical absorption of the tip-sample system [42][43][44][45]. Moreover, by modulating the external voltage and the cantilever oscillation at different frequencies, the topography and CPD maps may be simultaneously acquired [46].…”
Section: Indirect Effects Of Optical Fieldsmentioning
confidence: 99%