Optical investigations and Raman scattering characterisation of carbon bonding in hard amorphous hydrogenated carbon films

Lejeune, Martine; Durand-Drouhin, O.; Henocque, J.; Bouzerar, R.; Zeinert, A.; Benlahsen, M.

doi:10.1016/s0040-6090(01)00873-2

Cited by 24 publications

(7 citation statements)

References 22 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…However, the structure seems to be saturated in sp 3 C–H at 240 V. This means that hydrogen in DLC films affects clearly the sp 3 bonds formation. All of these bonds are hydrogenated in a‐C as reported by Robertson 45 and other authors 30, 31, 46, supporting the idea that hydrogen plays an important role in stabilizing hydrogenated sp 3 sites.…”

Section: Resultssupporting

confidence: 79%

Influence of bias voltage on the structure and deposition mechanism of diamond‐like carbon films produced by RF (13.56 MHz) CH₄ plasma

Ouchabane

Salah

Herrmann

et al. 2010

Physica Status Solidi (a)

View full text Add to dashboard Cite

Plasma enhanced chemical vapour deposition technique (PECVD) was used to grow diamond‐like carbon films using pure methane gas plasma. Structural, optical and mechanical properties of the obtained a‐C:H films were investigated as a function of bias voltage in the range 120–270 V, using different techniques. Elastic recoil detection analysis (ERDA) was employed to determine the hydrogen content and Fourier transform infrared spectroscopy (FTIR) was used to analyse the absorption of optically active hydrogen in the deposited films. The relative concentrations of sp2 and sp3 groups were determined from fitting of both X‐ray photoelectron spectroscopy (XPS) and FTIR spectra. Mechanical hardness and optical transmission were determined using nanoindentation and spectrophotometry, respectively. The results showed that the structure and properties of the films formed strongly depended on the applied bias voltage. In the range of energy considered the growth of the films was governed by a competition between both chemical and physical processes, with a dominance of physical process (subplantation) above 240 V, the energy at which more than 90% sp3 hybridization was obtained. Nanoindentation tests revealed hardness and Young's modulus of the films ranging from 12–15 and 116–155 GPa, respectively. The optical gap values deduced from the optical transmission spectra varied between 1.13 and 1.60 eV.

show abstract

Section: Resultssupporting

confidence: 79%

Influence of bias voltage on the structure and deposition mechanism of diamond‐like carbon films produced by RF (13.56 MHz) CH₄ plasma

Ouchabane

Salah

Herrmann

et al. 2010

Physica Status Solidi (a)

View full text Add to dashboard Cite

show abstract

“…15 Application of an RF bias to the substrate affects the energy of the impinging ions so that it allows control over the ion energy during the coating growth. 20 At high bias values, ions have high energy and play a role not only in the surface processes but also in the composition and the microstructure of the coatings (number of pinholes). 21 In this work, we study the influence of the RF bias on the excited species in the plasma, on the structure and the corrosion protection properties of coatings deposited on iron samples using a HMDSO-O 2 (80 : 20) precursor mixture.…”

Section: Introductionmentioning

confidence: 99%

Hexamethyldisiloxane (HMDSO)-plasma-polymerised coatings as primer for iron corrosion protection: influence of RF bias

et al. 2002

View full text Add to dashboard Cite

“…This indicates that the ordered degree of carbon films increases with increasing the NH 3 /(CH 4 þ NH 3 ) ratio. [26][27][28] The ratio of I D and I G is commonly used to approximately estimate the crystallite size of nanographite. An expression that gives the crystallite size (L a ) from the integrated intensity ratio I D /I G is given by: 29 L a ðnmÞ ¼ ð2:4 Â 10 À10 Þk 4 o ðI D =I G Þ À1 , where k o (¼ 633 nm) is the laser line wavelength used in the Raman experiment.…”

Section: Resultsmentioning

confidence: 99%

Effects of Ammonia Addition on Thermal Chemical Vapor Deposition Rates and Microstructures of Carbon Films

Lin

Lai

Liu

et al. 2011

J. Electrochem. Soc.

View full text Add to dashboard Cite

When ammonia is added in methane to form carbon films using thermal chemical vapor deposition, effects of the ammonia/methane ratio on the deposition rate and microstructures of carbon films are investigated. Meanwhile, effects of the deposition temperature, working pressure, and residence time on the deposition rate are also considered. Experimental results indicate that as the ammonia/methane rate increases, the deposition rate of carbon films decreases, and also, the ordered degree, nano-crystallite size, and sp2 carbon atoms of carbon films increase. Nevertheless, if the deposition temperature, working pressure, and residence time increase, the deposition rate of carbon films increases. The relationship between the deposition rate and deposition process parameters is formulated. The deposition process is controlled by the process to create mono-carbon and bi-carbon species in carbon films. Moreover, one mono-nitrogen will suppress about three mono-carbons to form carbon films. Few nitrogen and hydrogen atoms are incorporated into carbon films. The activation energy (507 kJ/mole) of carbon deposition is related to the activation energies of methane and ammonia dissociation. If the working pressure is smaller than a threshold value (30 kPa) or the residence time is shorter than a threshold value (1.5 s), no film is formed

show abstract

Optical investigations and Raman scattering characterisation of carbon bonding in hard amorphous hydrogenated carbon films

Cited by 24 publications

References 22 publications

Influence of bias voltage on the structure and deposition mechanism of diamond‐like carbon films produced by RF (13.56 MHz) CH₄ plasma

Influence of bias voltage on the structure and deposition mechanism of diamond‐like carbon films produced by RF (13.56 MHz) CH₄ plasma

Hexamethyldisiloxane (HMDSO)-plasma-polymerised coatings as primer for iron corrosion protection: influence of RF bias

Effects of Ammonia Addition on Thermal Chemical Vapor Deposition Rates and Microstructures of Carbon Films

Contact Info

Product

Resources

About

Optical investigations and Raman scattering characterisation of carbon bonding in hard amorphous hydrogenated carbon films

Cited by 24 publications

References 22 publications

Influence of bias voltage on the structure and deposition mechanism of diamond‐like carbon films produced by RF (13.56 MHz) CH4 plasma

Influence of bias voltage on the structure and deposition mechanism of diamond‐like carbon films produced by RF (13.56 MHz) CH4 plasma

Hexamethyldisiloxane (HMDSO)-plasma-polymerised coatings as primer for iron corrosion protection: influence of RF bias

Effects of Ammonia Addition on Thermal Chemical Vapor Deposition Rates and Microstructures of Carbon Films

Contact Info

Product

Resources

About

Influence of bias voltage on the structure and deposition mechanism of diamond‐like carbon films produced by RF (13.56 MHz) CH₄ plasma

Influence of bias voltage on the structure and deposition mechanism of diamond‐like carbon films produced by RF (13.56 MHz) CH₄ plasma