Optical interconnection using VCSELs and polymeric waveguide circuits

Sakamoto, Tadashi; Tsuda, Hitoshi; Hikita, Makoto; Kagawa, T.; Tateno, Kouta; Amano, C.

doi:10.1109/50.896208

Cited by 39 publications

(17 citation statements)

References 13 publications

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“…When the light source is misaligned to a waveguide core, it emits into the cladding and its transmitted power drops almost linearly at a rate of 0.011 dBmlJlm. UCL used a combination of crossings at straight sections and a curved waveguide to measure loss per crossing and achieving a consistent result with that of other workers [37,38] for the 90°crossing case. 0.023 dB per crossing was achieved at a 90°crossing which means output power dropped down 0.5% at each 90°c rossing.…”

Section: Loss Design Rulessupporting

confidence: 57%

Innovative Optical and Electronic Interconnect Printed Circuit Board Manufacturing research

Selviah

Hutt

Walker

et al. 2008

2008 2nd Electronics Systemintegration Technology Conference

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Section: Loss Design Rulessupporting

confidence: 57%

Innovative Optical and Electronic Interconnect Printed Circuit Board Manufacturing research

Selviah

Hutt

Walker

et al. 2008

2008 2nd Electronics Systemintegration Technology Conference

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“…INTRODUCTION W ITH RECENT advances in digital network and communication, the demand for wide bandwidth, high density, and low electromagnetic interference has been increased significantly in computing and switching systems [1], [2]. Polymeric optical waveguides are receiving much attention for planar photonic and optoelectronic application such as optical interconnects because of their relatively easy and low-cost fabrication and easy integration with other optoelectronic devices [3]- [6].…”

Section: Fabrication Of Multimode Polymeric Waveguides Andmentioning

confidence: 99%

Fabrication of Multimode Polymeric Waveguides and Micromirrors Using Deep X-Ray Lithography

Kim

2004

IEEE Photon. Technol. Lett.

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Abstract-Multimode polymeric waveguides and 45 micromirrors have been fabricated using deep X-ray lithography. Polymethylmetacrylate was used as a core layer and silica and silicone elastomer as a lower and upper cladding layer, respectively. The propagation loss of the waveguide was 0.54 dB/cm at 830 nm and the loss of micromirrors was less than 0.43 dB at the wavelength. The X-ray lithography technique offers the controllability of mirror angles to 45 and 45 so that it gives flexibility to the system architecture of optical interconnections.Index Terms-Micromirror, optical interconnects, polymeric multimode waveguide, X-ray lithography.

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“…We used the combination of crossings and the curved waveguide to measure loss per crossing and achieved a consistent result with that of other workers [8,9] for the 90°case. We measured each waveguide 50 times for each designed crossing angle.…”

Section: --mentioning

confidence: 64%

“…Design rules derived from the experimental measurement to assist optical system designers to optimise OPCB layout. 8. Acknowledgments…”

Section: Discussionmentioning

confidence: 99%

Photolithographically manufactured acrylate polymer multimode optical waveguide loss design rules

Wang¹,

Selviah²,

Papakonstantinou

et al. 2008

2008 2nd Electronics Systemintegration Technology Conference

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This paper describes how design rules are established for photolithographically manufactured acrylate polymer optical multimode waveguide components by optical experimental measurements made on the manufactured waveguide component. The loss of individual waveguide components, such as straight sections, 90°bends, crossings, tapers and tapered bends must be known so that the combined loss of a cascade of such elements can be found to determine whether the interconnection's optical power budget is sufficient to achieve a good bit error rate. However, the loss depends on several factors: the materials: the polymer used for the core and for the cladding, the fabrication technique: e.g. the photolithographic procedure and the precise temperature baking regime used, and the measurement technique: the optical source lateral size and angular divergence and precise position relative to the entrance of the waveguide, the output detector lateral size, its angular acceptance angle (if any) and its precise position relative to the exit of the waveguide. The experiments reported on photolithographically manufactured acrylate polymer multimode waveguide were performed at room temperature. A new technique for measure the transmitted power at waveguide crossings is reported for the first time.

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Optical interconnection using VCSELs and polymeric waveguide circuits

Cited by 39 publications

References 13 publications

Innovative Optical and Electronic Interconnect Printed Circuit Board Manufacturing research

Innovative Optical and Electronic Interconnect Printed Circuit Board Manufacturing research

Fabrication of Multimode Polymeric Waveguides and Micromirrors Using Deep X-Ray Lithography

Photolithographically manufactured acrylate polymer multimode optical waveguide loss design rules

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