2011
DOI: 10.1016/j.tsf.2011.04.027
|View full text |Cite
|
Sign up to set email alerts
|

Optical, electrical and structural properties of Cu2Te thin films deposited by magnetron sputtering

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
2
1

Citation Types

2
18
0

Year Published

2014
2014
2021
2021

Publication Types

Select...
7
1

Relationship

0
8

Authors

Journals

citations
Cited by 30 publications
(20 citation statements)
references
References 3 publications
2
18
0
Order By: Relevance
“…The KK-transformed ε1(ω) has the lowest sharp peak at 1.15 eV, resulting in a very high n = 5.65. which is close to our value of 6.01. For crystalline Cu2Te, we find an experimental study reporting n to be between 3.0 -6.0 [92] close to what we got (n = 5.470). It should be noted that our calculated optical band gap for Cu2Te is 0.0 eV which contributed to the large n similar to other chalcogenides just discussed.…”
Section: Optical Propertiessupporting
confidence: 89%
“…The KK-transformed ε1(ω) has the lowest sharp peak at 1.15 eV, resulting in a very high n = 5.65. which is close to our value of 6.01. For crystalline Cu2Te, we find an experimental study reporting n to be between 3.0 -6.0 [92] close to what we got (n = 5.470). It should be noted that our calculated optical band gap for Cu2Te is 0.0 eV which contributed to the large n similar to other chalcogenides just discussed.…”
Section: Optical Propertiessupporting
confidence: 89%
“…6a . To gain insight into the origin of this inelastically scattered light, it must be recalled that copper tellurides are p -type materials with rather large free hole densities of the order of 10 20 –10 21 cm −3 2 , 7 . For the films reported here, the free carrier density was of the order of 10 21 cm −3 (in two cases only slightly above 10 22 cm −3 ), vide infra .…”
Section: Resultsmentioning
confidence: 99%
“…Previous studies report that the Cu 2−x Te system is a p -type material with typically hole concentrations between 10 20 –10 21 cm −3 , and resistivities of the order of 10 −4 Ω cm 2 , 7 . In this work, the most conductive sample had a resistivity of 1.52 × 10 −4 Ω cm, with a mobility of 3.22 cm 2 /Vs and carrier density of 1.48 × 10 22 cm −3 .…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…Carrier concentration of deposited films is in the range of 10 20 -10 21 cm -3 . Ferizovic et al [7] (Cu 2 Te) and Luo et al [24] (Cu 1.4 Te) also reported that carrier concentration is in the order of…”
Section: Electrical Propertiesmentioning
confidence: 94%