2023
DOI: 10.1088/1742-6596/2426/1/012031
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Optical, Compositional and Electrical Properties of Transparent MgO Thin Film for ReRAM Devices

Abstract: The bipolar switching phenomenon is observed in the MgO-based memory cell having a metal-oxide-metal (W/MgO/Cu) structure. The MgO thin film offers a high transmittance of 86 - 88% for visible light, measured by UV-Visible spectroscopy. An optical bandgap of 4.2 eV is estimated from Tauc’s plot calculation from the absorption spectra of MgO thin film. In addition, the XPS scan on the O 1s and Mg 2p peaks reveals the types of chemical elements in the rf sputtered MgO thin film. The Mg 2p peak at 49.36 eV sugges… Show more

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Cited by 3 publications
(3 citation statements)
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“…Utilizing the absorbance data, the calculated bandgaps for Bare and Bare ST were found to be approximately 4.2 eV and 2.9 eV, respectively, as illustrated in Figure 13. The optical bandgap energy of Bare, estimated at 4.2 eV, corresponds to the optical bandgap energy of MgO [30]. This led to the conjecture that MgO was naturally formed in small quantities.…”
Section: Optical Characterizationmentioning
confidence: 99%
“…Utilizing the absorbance data, the calculated bandgaps for Bare and Bare ST were found to be approximately 4.2 eV and 2.9 eV, respectively, as illustrated in Figure 13. The optical bandgap energy of Bare, estimated at 4.2 eV, corresponds to the optical bandgap energy of MgO [30]. This led to the conjecture that MgO was naturally formed in small quantities.…”
Section: Optical Characterizationmentioning
confidence: 99%
“…Although the memristor-based synaptic device array can lead to faster parallel data processing using VMM, further research is required to minimize its power consumption. However, ReRAM has been studied for memory application [ 16 , 29 ], research on the device operation mechanism [ 29 , 30 , 31 ], and research on ReRAMs composed of materials that are not CMOS-compatible [ 32 , 33 ]. Thus, in this study, a memristor-based 2T synaptic device with a multilayer structure was proposed to reduce the operating power while maintaining high-density integration.…”
Section: Introductionmentioning
confidence: 99%
“…[21] This opens up a wide variety of possibilities for its use since it has a high optical bandgap (4-6 eV) allowing for a higher transparency. [22][23][24] MgO has been developed as a thin film using different processes such as spray, [25] sol-gel, [26] sputtering, [27] and chemical vapor deposition [28] techniques. In addition, ALD has been widely used for the growth of MgO thin films since the 1990s due to its precise growth control of conformal and uniform thin films as a result of the selflimiting, surface, and sequential reactions.…”
Section: Introductionmentioning
confidence: 99%