2012
DOI: 10.1109/jlt.2011.2181822
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Optical Channel Waveguide in KTiOAsO$_{4}$ Crystals Produced by O$^{+}$ion Implantation

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Cited by 4 publications
(2 citation statements)
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“…Jiao et al demonstrated the optical channel WG in x-cut KTiOAsO 4 crystal produced by photo masking and following direct O + ion implantation at an energy of 3.0 MeV and fluence of 5 × 10 13 ions/cm 2 . The propagation losses of the WG are 1.2 dB/cm, which displays satisfactory guiding characteristics [146]. Schematic illustration of the channel WG manufacturing procedure via ion-implantation is shown in Figure 6.…”
Section: Ion Implantationmentioning
confidence: 91%
“…Jiao et al demonstrated the optical channel WG in x-cut KTiOAsO 4 crystal produced by photo masking and following direct O + ion implantation at an energy of 3.0 MeV and fluence of 5 × 10 13 ions/cm 2 . The propagation losses of the WG are 1.2 dB/cm, which displays satisfactory guiding characteristics [146]. Schematic illustration of the channel WG manufacturing procedure via ion-implantation is shown in Figure 6.…”
Section: Ion Implantationmentioning
confidence: 91%
“…), surface patterning technologies are necessary to be incorporated. Such technologies contain lithography, chemical etching, diamond blade dicing and laser ablation [26]- [28]. Ultrafast laser ablation has been proven to be a feasible and simple method to manufacture ridged guiding structures in several optical materials, including single crystals and glasses [29]- [32].…”
Section: Introductionmentioning
confidence: 99%