2009
DOI: 10.1063/1.3133351
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Optical band gap and magnetic properties of unstrained EuTiO3 films

Abstract: Phase-pure, stoichiometric, unstrained, epitaxial ͑001͒-oriented EuTiO 3 thin films have been grown on ͑001͒ SrTiO 3 substrates by reactive molecular-beam epitaxy. Magnetization measurements show antiferromagnetic behavior with T N = 5.5 K, similar to bulk EuTiO 3. Spectroscopic ellipsometry measurements reveal that EuTiO 3 films have a direct optical band gap of 0.93Ϯ 0.07 eV.

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Cited by 72 publications
(52 citation statements)
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“…It should be mentioned here that the corresponding empty d states of the transition metals in EuZrO 3 and EuHfO 3 lie much higher in energy and as a consequence these oxides have significantly larger band gaps and are yellow and white, respectively [25]. The theoretically derived band gap is in rough agreement with conductivity measurements on thin films [26], our own conductivity data on bulk ceramic samples [27] as well as experimental results obtained by diffuse optical scattering, electron energy loss spectroscopy, and valence-band x-ray photoelectron spectroscopy [28].…”
Section: Syntheses and Structural Studiessupporting
confidence: 56%
“…It should be mentioned here that the corresponding empty d states of the transition metals in EuZrO 3 and EuHfO 3 lie much higher in energy and as a consequence these oxides have significantly larger band gaps and are yellow and white, respectively [25]. The theoretically derived band gap is in rough agreement with conductivity measurements on thin films [26], our own conductivity data on bulk ceramic samples [27] as well as experimental results obtained by diffuse optical scattering, electron energy loss spectroscopy, and valence-band x-ray photoelectron spectroscopy [28].…”
Section: Syntheses and Structural Studiessupporting
confidence: 56%
“…Details of the deposition were described elsewhere. 16 The 42 nm film was slightly relaxed, but the 22 nm film was fully (-0.9%) compressively strained, its XRD showing the same in-plane lattice parameter (3.870Å) as the substrate. The substrates of 10x10x1 mm size were provided by R. Uecker and his colleagues from the Institute of Crystal Growth, Berlin, Germany.…”
Section: Methodsmentioning
confidence: 99%
“…MBE has the potential to yield films with much lower defect densities than PLD, as it is a low-energetic deposition technique [25,26]. Prior MBE growth studies of RTiO 3 include ferroelectric LaTiO 3 þ x [27] and multiferroic EuTiO 3 [28], in which Ti is the þ4 valence state (EuTiO 3 is a band insulator). In this paper, we report on the growth of GdTiO 3 thin films using MBE.…”
Section: Introductionmentioning
confidence: 99%