Optical and nanostructural insights of oblique angle deposited layers applied for photonic coatings

Maudet, Florian; Lacroix, Bertrand; Santos, Antonio J.; Paumier, F.; Paraillous, Maxime; Hurand, S.; Corvisier, Alan; Marsal, Cecile; Giroire, Baptiste; Dupeyrat, Cyril; Garcı́a, R.; Morales, F. M.; Girardeau, T.

doi:10.1016/j.apsusc.2020.146312

Cited by 9 publications

(2 citation statements)

References 33 publications

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“…The OAD films inherit optical anisotropic property during their growth. They exhibit different refractive indices along the tilt direction of the nano-column and perpendicular to it [37]. For S polarisation, the electric field lies in the plane of the sample for both the configurations which leads to minor shift in the resonance.…”

Section: Resultsmentioning

confidence: 99%

Spatially selective narrow band and broadband absorption in Ag/SiO₂/Ag based trilayer thin films by oblique angle deposition of SiO₂ layer

Kar,

De,

Jena

et al. 2024

Nanotechnology

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We have experimentally demonstrated spatially selective absorption in Ag-SiO2-Ag based trilayer thin films by tuning the deposition angle of SiO2 layer. These structures generate cavity resonance which can be tuned across the substrate locations due to spatially selective thickness and refractive index of silicon oxide (SiO2) film sandwiched between metallic silver (Ag) mirrors. Spatially selective property of SiO2 film is obtained by oblique angle deposition (OAD) technique using an electron beam evaporation system. The resonance wavelength of absorption in this trilayer structure shifts across the substrate locations along the direction of oblique deposition. The extent of shift in resonance increases with increase in angle of deposition of SiO2 layer. 4.14 nm/mm average shift of resonance wavelength is observed when SiO2 is deposited at 400 whereas 4.84 nm/mm average shift is observed when SiO2 is deposited at 600. We observed that the width of resonance increases with angle of deposition of the cavity layer and ultimately the resonant absorption disappears and becomes broadband when SiO2 is deposited at glancing angle deposition (GLAD) configuration. Our study reveals that there is a suitable range of oblique angle of deposition from 400 to 600 for higher spatial tunability and resonant absorption whereas the absorption becomes broadband for glancing angle deposition.

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Section: Resultsmentioning

confidence: 99%

Spatially selective narrow band and broadband absorption in Ag/SiO₂/Ag based trilayer thin films by oblique angle deposition of SiO₂ layer

Kar,

De,

Jena

et al. 2024

Nanotechnology

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“…The last years have witnessed the flourishing of numerous applications and technological devices based on nanocolumnar porous, thin films [1]. These are formed by nanocolumns with a typical diameter and side-to-side distance in the order of 100 nm, making these materials less dense and with a much larger specific surface than their compact counterpart [2][3][4], and with different optical, electrical, and magnetic properties [5][6][7][8][9][10][11][12]. These features make them good candidates for the development of numerous technological devices, such as gas or liquid sensors, optical coatings, and electrodes or instruments for fluid manipulation, among others [13][14][15][16][17][18][19][20][21][22][23][24][25][26].…”

Section: Introductionmentioning

confidence: 99%

Structure and Void Connectivity in Nanocolumnar Thin Films Grown by Magnetron Sputtering at Oblique Angles

Alvarez,

Regodon,

Acosta-Rivera

et al. 2023

Coatings

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The morphology and void connectivity of thin films grown by a magnetron sputtering deposition technique at oblique geometries were studied in this paper. A well-tested thin film growth model was employed to assess the features of these layers along with experimental data taken from the literature. A strong variation in the film morphology and pore topology was found as a function of the growth conditions, which have been linked to the different collisional transport of sputtered species in the plasma gas. Four different characteristic film morphologies were identified, such as (i) highly dense and compact, (ii) compact with large, tilted mesopores, (iii) nanocolumns separated by large mesopores, and (iv) vertically aligned sponge-like coalescent nanostructures. Attending to the topology and connectivity of the voids in the film, the nanocolumnar morphology was shown to present a high pore volume and area connected with the outside by means of mesopores, with a diameter above 2 nm, while the sponge-like nanostructure presented a high pore volume and area, as well as a dense network connectivity by means of micropores, with a diameter below 2 nm. The obtained results describe the different features of the porous network in these films and explain the different performances as gas or liquid sensors in electrochromic applications or for infiltration with nanoparticles or large molecules.

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Tailoring of optical and wetting properties of electron beam deposited Ag nanostructure films by oblique angle deposition

Ripain

Lim

et al. 2022

J Opt

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Optical and nanostructural insights of oblique angle deposited layers applied for photonic coatings

Cited by 9 publications

References 33 publications

Spatially selective narrow band and broadband absorption in Ag/SiO₂/Ag based trilayer thin films by oblique angle deposition of SiO₂ layer

Spatially selective narrow band and broadband absorption in Ag/SiO₂/Ag based trilayer thin films by oblique angle deposition of SiO₂ layer

Structure and Void Connectivity in Nanocolumnar Thin Films Grown by Magnetron Sputtering at Oblique Angles

Tailoring of optical and wetting properties of electron beam deposited Ag nanostructure films by oblique angle deposition

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Optical and nanostructural insights of oblique angle deposited layers applied for photonic coatings

Cited by 9 publications

References 33 publications

Spatially selective narrow band and broadband absorption in Ag/SiO2/Ag based trilayer thin films by oblique angle deposition of SiO2 layer

Spatially selective narrow band and broadband absorption in Ag/SiO2/Ag based trilayer thin films by oblique angle deposition of SiO2 layer

Structure and Void Connectivity in Nanocolumnar Thin Films Grown by Magnetron Sputtering at Oblique Angles

Tailoring of optical and wetting properties of electron beam deposited Ag nanostructure films by oblique angle deposition

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Spatially selective narrow band and broadband absorption in Ag/SiO₂/Ag based trilayer thin films by oblique angle deposition of SiO₂ layer

Spatially selective narrow band and broadband absorption in Ag/SiO₂/Ag based trilayer thin films by oblique angle deposition of SiO₂ layer