2023
DOI: 10.3390/coatings13060991
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Structure and Void Connectivity in Nanocolumnar Thin Films Grown by Magnetron Sputtering at Oblique Angles

Rafael Alvarez,
Guillermo Regodon,
Hiedra Acosta-Rivera
et al.

Abstract: The morphology and void connectivity of thin films grown by a magnetron sputtering deposition technique at oblique geometries were studied in this paper. A well-tested thin film growth model was employed to assess the features of these layers along with experimental data taken from the literature. A strong variation in the film morphology and pore topology was found as a function of the growth conditions, which have been linked to the different collisional transport of sputtered species in the plasma gas. Four… Show more

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“…The high crystallinity in the nanostructured layer was associated with the superior crystalline quality of the compact layer. Within the scientific literature, it is becoming increasingly clear that the epitaxial growth in multilayer films [ 51 ] is favored by the crystalline quality of the first layer. Evidence of this superior crystalline quality is seen both in the XRD patterns and in the IR analysis, where the absorption band corresponding to the Ti–O–Ti bond is better defined for this sample, and the XRD peak associated with the (101) direction presents a higher intensity compared to the other two samples.…”
Section: Discussionmentioning
confidence: 99%
“…The high crystallinity in the nanostructured layer was associated with the superior crystalline quality of the compact layer. Within the scientific literature, it is becoming increasingly clear that the epitaxial growth in multilayer films [ 51 ] is favored by the crystalline quality of the first layer. Evidence of this superior crystalline quality is seen both in the XRD patterns and in the IR analysis, where the absorption band corresponding to the Ti–O–Ti bond is better defined for this sample, and the XRD peak associated with the (101) direction presents a higher intensity compared to the other two samples.…”
Section: Discussionmentioning
confidence: 99%