Optical and Electrical Properties of Polymerizing Plasmas and Their Correlation with DLC Film Properties

Rangel, Elidiane Cipriano; Cruz, Nilson Cristino da; Kayama, M. E.; Rangel, Rita C.C.; Marins, N. M. S.; Durrant, Steven F.

doi:10.1023/b:papo.0000039813.33634.c6

Cited by 11 publications

(9 citation statements)

References 15 publications

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“…Increase of the RF power leads to production of more active plasma that contains some other carbonaceous species like as C x and CH y which contribute in deposition process [24]. Hence, the growth rate rises up as the RF power increases that demonstrates that the CH radicals are not the only species who have the main role in deposition process.…”

Section: Resultsmentioning

confidence: 99%

Dual-Frequency Plasma Enhanced Chemical Vapor Deposition of Diamond-Like Carbon Thin Films

2012

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Dual-frequency plasma enhanced chemical vapor deposition was used to grow diamond-like carbon thin lms from CH4, H2 gas mixture. The eects of radio frequency, microwave power, and gas ratio were investigated. Various species have been identied in the CH4H2 plasma using optical emission spectroscopy and their eects on lm properties have been studied. Increasing the RF power to 400 W, the variation trend of refractive index and CH, C2 intensity ratios change beyond the 300 W, but the growth rate shows the continuous increasing character from 6 to 11.6 nm/min. Increasing the hydrogen content in the system, the intensity ratio of CH, C2, CH + and growth rate show decreasing tendency and the refractive index rises from 1.98 to 2.63. Adding MW produced plasma to the system grows the refractive index to 2.88 and growth rate to 10.8 nm/min. The water contact angle rises from 58.95• to 73.74• as the RF power increases to 300 W but begins to reduce until 400 W. In addition, the contact angle shows a growing tendency by increasing the hydrogen ow to the chamber. In addition, the structures of the lms were investigated by the Raman spectroscopy.

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Section: Resultsmentioning

confidence: 99%

Dual-Frequency Plasma Enhanced Chemical Vapor Deposition of Diamond-Like Carbon Thin Films

2012

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“…This figure indicates that a-C:H films is predominantly formed by sp 2 bonding. Both peak positions shift towards lower wavenumbers as the power increased, which suggests an increase in the sp 3 bonding [17]. In this sense, we calculated the ratio of D and G peak areas, I D /I G , which is depicted in figure 2.…”

Section: Methodsmentioning

confidence: 99%

“…Besides, during the deposition, the film is also bombarded by all species presented in the discharge, promoting recombination via chain crosslinking. All these processes are intensified by heavy species as argon ions, which is abundant into the discharge [17]. In figure 3 the hardness of the films is plotted as a function of the discharge power.…”

Section: Methodsmentioning

confidence: 99%

Amorphous hydrogenated carbon films treated by SF₆plasma

Marins

Mota

Santos

et al. 2009

J. Phys.: Conf. Ser.

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This work was performed to verify the chemical structure, mechanical and hydrophilic properties of amorphous hydrogenated carbon films prepared by plasma enhanced chemical vapor deposition, using acetylene/argon mixture as monomer. Films were prepared in a cylindrical quartz reactor, fed by 13.56 MHz radiofrequency. The films were grown during 5 min, for power varying from 25 to 125 W at a fixed pressure of 9.5 Pa. After deposition, all samples were treated by SF 6 plasma with the aim of changing their hydrophilic character. Film chemical structure investigated by Raman spectroscopy, revealed the increase of sp 3 hybridized carbon bonds as the plasma power increases. Hardness measurements performed by the nanoindentation technique showed an improvement from 5 GPa to 14 GPa following the increase discharge power. The untreated films presented a hydrophilic character, which slightly diminished after SF 6 plasma treatment.

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“…Ao longo das últimas décadas, a pesquisa e o desenvolvimento de materiais nanoestruturados à base de carbono vem se tornando cada vez mais fundamental para o avanço das indústrias aeroespaciais, eletrônica, biomédicas entre outras (BRISCOE, 1990;ROBERTS, 1990;BUTTER et al, 1995;RODIL, 2000;SANTOS L, 2004;ERDEMIR, 2001;RANGEL et al, 2004).…”

Section: Carbono Amorfo Hidrogenado (A-c:h)unclassified

“…(JACOB, 1998;MOLLER, 1993 (ROBERTSON, 1993;ROBERTSON, 1994;GRILL, 1993 Em trabalhos apresentados na literatura foi constatado que íons C 2 H 2 + são os mais prováveis em plasmas de misturas de acetileno e argônio, empregados na deposição de filmes do tipo diamante (WEILER, 1994;LEE, 1996;RANGEL et al, 2004 (BIERDERMAN , 1992;DAVIS, 1993;ROBERTSON, 1993;GRANIER, 1994;RANGEL et al, 2004). Espécies provenientes do acetileno, tais como C, CH, CH 2 , etc., possuem energias de ionização menores que a necessária para ionizar o argônio.…”

Section: Hibridização Do Carbonounclassified

Efeito da incorporação de flúor nas propriedades de superfície de filmes DE aC:H

Marins¹

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"Os pequenos atos que se executam são melhores que todos aqueles grandes que se planejam." George C. Marshal AGRADECIMENTOSEm primeiro lugar agradeço a Deus, pois sem Ele nada seria possível.Aos meus filhos André Luiz e Vanessa, pela compreensão, paciência e que apesar das dificuldades, sempre incentivaram meus estudos.À minha orientadora, Prof a . Drª. Elidiane Cipriano Rangel pelas valiosas discussões, paciência e confiança, para a realização deste trabalho.Ao Prof. Dr. Rogério Pinto Mota que jamais deixou de me incentivar. Sem a sua Coorientação, dedicação e auxílio, o estudo aqui apresentado seria praticamente impossível.Ao Prof. Dr. Roberto Yzumi Honda, pela amizade, pelo carinho e contribuição nos trabalhos experimentais, sem a qual seria difícil concluí-lo.Ao Sr. José Benedito Galhardo pela pronta ajuda com os equipamentos do laboratório. RESUMO Filmes finos de carbono amorfo hidrogenado (a-C:H) e fluorados (a-C:H:F)foram depositados a partir de plasmas de misturas de acetileno/argônio e acetileno/argônio/hexafluoreto de enxofre. Para a primeira mistura de gases, o plasma foi mantido por 5 e 10 minutos a uma pressão de 9,5 Pa (30% C 2 H 2 e 70% Ar) enquanto para a segunda ele foi mantido por 5 minutos utilizando-se 30% C 2 H 2 , 65%Ar e 5% SF 6 a uma pressão total de 9,5 Pa. A potência do sinal de excitação foi variada ABSTRACTHydrogenated amorphous carbon (a-C:H) and fluorinated (a-C:H:F) thin films were deposited from acetylene/argon and acetylene/argon/sulfur hexafluoride mixtures. For the first gas mixture, the plasma was kept for 5 or 10 minutes using 9.5 Pa of pressure (30% C 2 H 2 e 70% Ar) while for the second it was kept for 5 minutes using 30% C 2 H 2 , 65% Ar e 5% SF 6 at a total pressure of 9.5 Pa. The power of the excitation signal was changed from 5 to 125 W and the effect of such parameter on the properties of the films was investigated. To fluorinate the a-C:H films they were submitted, immediately after deposition and without exposure to atmosphere, to SF 6 plasma treatments. Such procedures were conducted for 5 minutes in radiofrequency (13.56MHz, 70 W) plasmas of 13.3 Pa of pressure. Raman and X-Ray photoelectron spectroscopes were employed to investigate, respectively, the microstructure and chemical composition of the films. Film hardness and friction coefficient were determined from nanoindentation and tribometry techniques, respectively. The receptivity of the samples towards water was evaluated through contact angle data and roughness was measured by optical interferometry. The a-C:H films obtained from the C 2 H 2 and Ar plasma mixtures in lower power (5 e 25 W) presented polymer-like structures and compositions while those prepared using intermediary power levels ( 50 e 75 W) presented higher proportions of tetrahedral carbon bonds and low proportions of hydrogen, suggesting a Diamond like Carbon (DLC) structure. Films deposited using the higher power (100 e 125 W) plasmas presented a graphitic structure. As the material prepared with lower power signals were submitted to the S...

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Optical and Electrical Properties of Polymerizing Plasmas and Their Correlation with DLC Film Properties

Cited by 11 publications

References 15 publications

Dual-Frequency Plasma Enhanced Chemical Vapor Deposition of Diamond-Like Carbon Thin Films

Dual-Frequency Plasma Enhanced Chemical Vapor Deposition of Diamond-Like Carbon Thin Films

Amorphous hydrogenated carbon films treated by SF₆plasma

Efeito da incorporação de flúor nas propriedades de superfície de filmes DE aC:H

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Optical and Electrical Properties of Polymerizing Plasmas and Their Correlation with DLC Film Properties

Cited by 11 publications

References 15 publications

Dual-Frequency Plasma Enhanced Chemical Vapor Deposition of Diamond-Like Carbon Thin Films

Dual-Frequency Plasma Enhanced Chemical Vapor Deposition of Diamond-Like Carbon Thin Films

Amorphous hydrogenated carbon films treated by SF6plasma

Efeito da incorporação de flúor nas propriedades de superfície de filmes DE aC:H

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Product

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Amorphous hydrogenated carbon films treated by SF₆plasma