1975
DOI: 10.6028/nbs.sp.400-20
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Optical and dimensional-measurement problems with photomasking in microelectronics

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“…Hence there is a mismatch between photomask layout and the design layout [7,15,16]. This has a greater impact on the weights values.…”
Section: Introductionmentioning
confidence: 96%
“…Hence there is a mismatch between photomask layout and the design layout [7,15,16]. This has a greater impact on the weights values.…”
Section: Introductionmentioning
confidence: 96%