Optical Admittance Monitor through a Dynamic Interferometer

Abstract

A way to increase the optical monitoring sensitivity in quarterwave stack fabrication by modified optical admittance loci was demonstrated. The optical admittance value was obtained from an in-situ dynamic interferometer combing with a photodetector, and the result was compared with ellipsometer measurement.

In-situ interferometric monitoring of optical coatings

“…Previous studies have shown that such interferometric measurements can be practically managed within operational deposition chambers [8][9][10]. In particular, the set-up proposed by Lee and coworkers [8,9] seemed to fulfill most of our objectives.…”

“…Previous studies have shown that such interferometric measurements can be practically managed within operational deposition chambers [8][9][10]. In particular, the set-up proposed by Lee and coworkers [8,9] seemed to fulfill most of our objectives. It uses a polarimetric Michelson interferometer equipped with a micro-polarizer pixelated camera to achieve an instantaneous acquisition of four different phase states of the field reflected or transmitted by the sample [11,12].…”