Proceedings of International Solid State Sensors and Actuators Conference (Transducers '97)
DOI: 10.1109/sensor.1997.635501
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Operation of α(6H)-SiC pressure sensor at 500°C

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Cited by 30 publications
(27 citation statements)
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“…After improving the high-temperature stability, a pressure sensor with operating temperatures up to 350 8C was reported [124]. In two subsequent publications a pressure sensor which was characterized from room temperature up to 500 8C was presented [125] and also an improved version up to 600 8C. It was fabricated by using a photoelectrochemical etching process [34,35] to structure the ntype epilayer on the top, which was deposited on a p-type layer on a 6H-SiC substrate supplied by Cree [3].…”
Section: Sic Pressure Sensorsmentioning
confidence: 99%
“…After improving the high-temperature stability, a pressure sensor with operating temperatures up to 350 8C was reported [124]. In two subsequent publications a pressure sensor which was characterized from room temperature up to 500 8C was presented [125] and also an improved version up to 600 8C. It was fabricated by using a photoelectrochemical etching process [34,35] to structure the ntype epilayer on the top, which was deposited on a p-type layer on a 6H-SiC substrate supplied by Cree [3].…”
Section: Sic Pressure Sensorsmentioning
confidence: 99%
“…Due to the continuous progress of micromachining technology in last decades, micro-electromechanical system (MEMS) sensors started playing a major role in pressure measurement [9]. Nowadays there are many types of pressure sensing technologies for different applications, such as capacitive pressure sensors that utilize a diaphragm and a pressure cavity to create a variable capacitance [1013]; piezoelectric pressure sensors that utilize the piezoelectric effect in some materials to measure the strain caused by pressure [1418]; surface acoustic wave (SAW) pressure sensors that utilize the phase velocity variation of surface acoustic wave on piezoelectric substrate when pressure is applied [1923]; optical pressure sensors in which the characteristics of optical signal such as intensity, polarization, phase or spectrum are modulated by the pressure stimulus [2429]; and the most commonly used piezoresistive pressure sensors, for which the resistance of the piezoresistive material can be altered by the pressure applied on it [3034]. …”
Section: Introductionmentioning
confidence: 99%
“…Although conventional wet chemical techniques are not effective in etching structures into SiC substrates, several electrochemical etch processes have been demonstrated and used in the fabrication of bulk micromachined SiC MEMS devices from 6H-and 4H-SiC substrates. Examples of such structures include pressure sensors [14], accelerometers [15], and more recently, biosensors [16]. It is worth mentioning that, the good biocompatibility of devices made with common micromachining technologies allows the exploration of these technologies.…”
Section: Bulk Micromachiningmentioning
confidence: 99%