2014
DOI: 10.7567/jjap.53.04ep08
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Open circuit voltage decay characteristics of 4H-SiC p–i–n diode with carbon implantation

Abstract: The open circuit voltage decay (OCVD) characteristics of 4H-SiC p–i–n diodes fabricated with the carbon implantation process are investigated. The bulk carrier lifetime in the fabricated devices can be estimated using OCVD measurements. The carrier lifetime at a high injection level (τHL) of the fabricated diode with carbon implantation is 10.5 µs, which is extremely long as compared with that of a diode fabricated with the standard process (1.3 µs).

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Cited by 12 publications
(6 citation statements)
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“…The calculated results show tendencies similar to those of the experiments, whereas the experimental temperature dependence for the undoped sample is slightly stronger than the calculation owing to the temperature dependence of the capture cross section. Although the recombination center for Nb-0.01% is shallow in the energy level compared that in conventional semiconductors, the presence of such a shallow recombination center has also been suggested in SiC [39]. The shallow recombination center in Nb-0.01% may originate from an acceptor level formed by the self-compensation mechanism against Nb donor doping as suggested by the observation of the net donor concentrations in figure 3.…”
Section: Resultsmentioning
confidence: 91%
“…The calculated results show tendencies similar to those of the experiments, whereas the experimental temperature dependence for the undoped sample is slightly stronger than the calculation owing to the temperature dependence of the capture cross section. Although the recombination center for Nb-0.01% is shallow in the energy level compared that in conventional semiconductors, the presence of such a shallow recombination center has also been suggested in SiC [39]. The shallow recombination center in Nb-0.01% may originate from an acceptor level formed by the self-compensation mechanism against Nb donor doping as suggested by the observation of the net donor concentrations in figure 3.…”
Section: Resultsmentioning
confidence: 91%
“…The more Fe 3+ were introduced, more photocatalytic active sites were produced [50] . Nevertheless, on the other hand, the introduced Fe 3+ sites could be the charge recombination center when the doping amount was higher than 15 % [61,62] . It is well‐advised to say finely tuning the Fe 3+ doping amount to acquire optimal band structure and charge transfer capacity is really crucial to enhancing the photocatalytic performance of CTF‐1.…”
Section: Resultsmentioning
confidence: 99%
“…29) This test equipment is capable of performing double-pulse tests at up to 13 kV, 120 A, and 300 °C. The forward recovery characteristics and open-circuit voltage decay (OCVD) characteristics of the body diode were measured by applying and energizing the specified voltage and current waveforms for the device using equipment for testing transient electrical characteristics (manufactured by Coper Electronics), 30) and the waveforms were measured using a 12 bit oscilloscope (HDO4024A, manufactured by LeCroy). In this paper, a double-pulse test was conducted with a 50 mH load at a DC bus voltage of 6 kV and current of 11.5 A.…”
Section: Measurement Of the Electrical Characteristics Of 13 Kv Sic-d...mentioning
confidence: 99%