One-step 3D full-colour and achromatic transmission holograms digitally printed using a 440nm pulsed laser for embossed applications

Zacharovas, Stanislovas; Nikolskij, Andrej; Bakanas, Ramūnas; Brotherton-Ratcliffe, David

doi:10.1117/12.2008469

Cited by 4 publications

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“…In our primary investigations, 14,15 it was reported that transmission holograms can be successfully recorded in commercially available positive photoresists using a single pulse of 440-nm pulsed laser beam at low energy density (approximately 8 mJ∕cm 2 ). However, the sensitivity of commercially available photoresists to continuous radiation is rather low (for λ ¼ 442 nm, E ¼ 65 − 150 mJ∕cm 2 is required).…”

Section: Introductionmentioning

confidence: 99%

Holograms recording with pulsed laser on diazonaphthoquinone-novolac-based photoresists and their nanocomposites

et al. 2014

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Direct write digital holography technique (DWDH) using a single 440-nm pulsed laser exposure has been proposed to record master holograms on commercially available positive-tone photoresist systems based on a mixture of diazonaphthoquinone and novolac resin (DNQ-novolac) of different thicknesses. The DNQ-novolac nanocomposite doped with copper nanoparticles (CuNPs) films was also used. The method for numerical evaluation of hologram quality based on reflected beam diffraction intensity measurements was proposed and verified. It was found that all investigated photoresist nanocomposites were sensitive enough to record holographic structures at low single pulse laser exposures (from 3.3 to 18.0 mJ∕cm 2 ). Moreover, doping DNQ-novolac nanocomposite with CuNPs s increases its sensitivity to pulsed laser exposure by more than 30%. The potential of single pulsed laser exposures to record high quality master holograms on commercially available and metal nanoparticles doped photoresists with at least five times lower exposures values as compared to the continuous-wave laser exposures usually used to expose photoresist materials in holographic applications, opens the possibility to use pulsed lasers for quick master-originals origination for embossed holograms applying a DWDH technique or analog methods.

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Section: Introductionmentioning

confidence: 99%

Holograms recording with pulsed laser on diazonaphthoquinone-novolac-based photoresists and their nanocomposites

et al. 2014

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Master-holograms recorded with pulsed laser on photoresist

Zacharovas

Adlienė

Bakanas

et al. 2014

Practical Holography XXVIII: Materials and Applications

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Comparison of diffraction patterns exposed by pulsed and CW lasers on positive-tone photoresist

et al. 2017

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Two different grating formation geometries for recording onto the positive-tone photoresist with pulsed laser and continuous-wave sources are analyzed and compared. Diffraction efficiency measurements and atomic force microscopy (AFM) examination have been performed in order to investigate the optical and topographical properties of the recorded structures. Gratings patterned by a continuous-wave laser and by a pulsed laser working in the single pulse and multipulse regimes showed different surface roughness and optical properties. The possible reasons for surface roughness and effective exposure differences between gratings created with pulsed and continuous-wave laser radiations are discussed. The processing schemes for diffractive structures patterned by pulsed laser onto positive-tone photoresist for commercial hologram production are analyzed and presented in this work.

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One-step 3D full-colour and achromatic transmission holograms digitally printed using a 440nm pulsed laser for embossed applications

Cited by 4 publications

References 0 publications

Holograms recording with pulsed laser on diazonaphthoquinone-novolac-based photoresists and their nanocomposites

Holograms recording with pulsed laser on diazonaphthoquinone-novolac-based photoresists and their nanocomposites

Master-holograms recorded with pulsed laser on photoresist

Comparison of diffraction patterns exposed by pulsed and CW lasers on positive-tone photoresist

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