Comparison of diffraction patterns exposed by pulsed and CW lasers on positive-tone photoresist

Abstract

Two different grating formation geometries for recording onto the positive-tone photoresist with pulsed laser and continuous-wave sources are analyzed and compared. Diffraction efficiency measurements and atomic force microscopy (AFM) examination have been performed in order to investigate the optical and topographical properties of the recorded structures. Gratings patterned by a continuous-wave laser and by a pulsed laser working in the single pulse and multipulse regimes showed different surface roughness and optical properties. The possible reasons for surface roughness and effective exposure differences between gratings created with pulsed and continuous-wave laser radiations are discussed. The processing schemes for diffractive structures patterned by pulsed laser onto positive-tone photoresist for commercial hologram production are analyzed and presented in this work.

Progress in the Synthetic Holographic Stereogram Printing Technique

“…Many researches and companies have successfully realized the synthetic holographic stereogram printing with pulsed lasers [47][48][49]. Geola Inc. and XYZ Imaging Inc. have cooperated to produce holographic printers, which could print differently sized, high-quality, and colorful holograms automatically.…”

Acrylate dendritic monomer for ultrafast holographic recording with pulse exposure

“…1 Compared with continuous-wave exposure, pulse exposure is more likely to fail holographic reciprocity law within microsecond or less duration, and thus it requires higher sensitivity of medium. 2,3 Photopolymer is well-recognized as an ideal holographic recording medium since its' high photosensitivity and fast response. [4][5][6][7][8] Its recording principle is based on the formation of a holographic grating with refractive index modulation due to the photopolymerization of monomer in the coherent bright region and the migration of monomer from dark region to bright region under two coherent beams interference.…”

Mass‐Spectrometric Observation of Counter Anion Production in SU‐8 Exposed to UV Light and its Use for Dill C Parameter Determination

“…One efficient way of obtaining localized manipulation of a polymer is by incorporating a photoactive compound in its precursor resin and exposing it to some form of radiation, either electromagnetic or heavy particles, at the desired positions. When using this strategy, the design of the production process or interpretation of the results obtained often need thorough simulation of the irradiation process, which in turn requires accurate knowledge of all physical and chemical parameters of the materials employed.…”