On Wetting Angles and Nucleation Energies during the Electrochemical Nucleation of Cobalt onto Glassy Carbon from a Deep Eutectic Solvent

Manh, Tu Le; Arce-Estrada, E.M.; Romero-Romo, M.; Mejía-Caballero, I.; Aldana-González, J.; Palomar-Pardavé, M.

doi:10.1149/2.1061712jes

Cited by 34 publications

(42 citation statements)

References 32 publications

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“…However, the diffusion coefficients in DES with LCO dissolved are lower than in DES containing only CoCl 2 . (Figure 3c) The diffusion coefficient (2.66±0.87×10 −7 cm 2 s −1 at 104 °C) in CoCl 2 ‐dissolved ChCl+urea in our work is within the range of the reported values (1.70×10 −6 cm 2 s −1 by Li et al., [16d] 2.7×10 −7 cm 2 s −1 by Manh et al., [26] and 1.22×10 −7 cm 2 s −1 by Cao et al [16c] . at 100 °C.…”

Section: Resultssupporting

confidence: 90%

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Cobalt Electrochemical Recovery from Lithium Cobalt Oxides in Deep Eutectic Choline Chloride+Urea Solvents

Wang

Garg

et al. 2021

ChemSusChem

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Electrochemical recovery of the cobalt in deep eutectic solvent shows its promise in recycling and recovery of valuable elements from the spent lithium-ion battery due to its high selectivity and minimal environmental impacts. This work unveiled the roles of the substrates, applied potentials, and operating temperatures on the performance of cobalt electrochemical recovery in a deep eutectic choline chloride + urea solvent. The solvent contains cobalt and lithium ions extracted from lithium cobalt oxides -3an essential lithium-ion battery cathode material. Our results highlight that the substrate predetermines the cobalt recovery modes via substrate-cobalt interactions, which could be predicted by the cobalt surface segregation energies and crystallographic misfits. We also show that a moderate cathode potential under À 1.0 V vs. silver quasireference electrode at 94-104°C is essential to ensure a selective cobalt recovery at an optimal rate. We also found that the stainless-steel mesh is an optimal substrate for cobalt recovery due to its relatively high selectivity, fast recovery rate, and easy cobalt collection. Our work provides new insights on metal recovery in deep eutectic solvents and offers a new avenue to control the metal electrodeposition modes via modulation of substrate compositions and crystal structures.

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Section: Resultssupporting

confidence: 90%

“…for ChCl+urea solvent with CoCl 2 dissolved. We also observed linear relation between cathodic peak current density and the square root of the scan rate at temperatures between 82 °C and 125 °C (Figure 3b) which indicates the Co reduction is controlled by the diffusion to tungsten working electrode [16c,26] …”

Section: Resultsmentioning

confidence: 67%

Cobalt Electrochemical Recovery from Lithium Cobalt Oxides in Deep Eutectic Choline Chloride+Urea Solvents

Wang

Garg

et al. 2021

ChemSusChem

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“…Nowadays, a great amount of intense effort is put into reformulating the classical models to better rationalize the nucleation and growth mechanism. These reformulations try to introduce phenomena like surface diffusion and particle aggregation or coalescence kinetics as variables in the nucleation and growth of the particles. ,− …”

Section: Resultsmentioning

confidence: 99%

“…These reformulations try to introduce phenomena like surface diffusion and particles aggregation or coalescence kinetics as variables in the nucleation and growth of the particles. 48,[64][65][66]…”

Section: Figures 2a and 2bmentioning

confidence: 99%

Surface Sensitive Nickel Electrodeposition in Deep Eutectic Solvent

Sebastián

Giannotti

Gómez

et al. 2018

ACS Appl. Energy Mater.

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The first steps of nickel electrodeposition in a deep eutectic solvent (DES) are analysed in detail. Several substrates from glassy carbon to Pt(111) were investigated pointing out the surface sensitivity of the nucleation and growth mechanism. For that, cyclic voltammetry and chronoamperometry, in combination with scanning electron microscopy (SEM), were employed. X-ray diffraction (XRD) and atomic force microscopy (AFM) were used to more deeply analyse the Ni deposition on Pt substrates.In a 0.1 M NiCl 2 + DES solution (at 70ºC), the nickel deposition on glassy carbon takes place within the potential limits of the electrode in the blank solution. Although, the electrochemical window of Pt|DES is considerably shorter than on glassy carbon|DES, it was still sufficient for the nickel deposition. On Pt electrode, the negative potential limit was enlarged while the nickel deposit growed, likely because of the lower catalytic activity of the nickel towards the reduction of the DES. At lower overpotentials, different hydrogenated Ni structures were favoured, most likely because of the DES co-reduction on the Pt substrate. Nanometric metallic nickel grains of rounded shape were obtained in any substrate, as evidenced by the FE-SEM. Passivation phenomena, related to the formation of Ni oxide and Ni hydroxylated species, were observed at high applied overpotentials. At low deposited charge, on Pt(111) the AFM measurements showed the formation of rounded nanometric particles of Ni, which rearranged and formed small triangular arrays at sufficiently low applied overpotential (Scheme 1). This particle pattern was induced by the <111> orientation and related to surface sensitivity of the nickel deposition in DES. The present work provides deep insights into the Ni electrodeposition mechanism in the selected deep eutectic solvent. Scheme 1. Representation of the Ni(II) electrodeposition in DES on Pt(111) and AFM image (2 x 2 µm 2 ) of the Ni clusters.

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“…This expression considers a contact angle of 90° between the Bi nuclei and the GaAs surface. As done in refs and , we have fitted the experimental data (ln( A ) vs η Bi ) according to eq . The best-fit parameters for j 0 , α, and σ have been obtained excluding the value of A obtained at η SEI = −0.8 V (Table ).…”

Section: Resultsmentioning

confidence: 99%

Electrodeposition of Bi Thin Films on n-GaAs(111)B. I. Correlation between the Overpotential and the Nucleation Process

Prados

Ranchal

2018

J. Phys. Chem. C

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Bismuth thin films constitute a promising nanostructure for the fabrication of spin-based devices. To achieve this goal, it is necessary to obtain high-quality Bi layers with controlled and reproducible properties. Therefore, studies focused on the understanding of the nucleation process and the correlation between the growth conditions and the film properties are of great interest. In this work, we have studied the electrodeposition of Bi thin films onto GaAs(111)B substrates at different overpotentials. In Part I, we have analyzed the nucleation of the films by means of potentiostatic curves. The current density transients have been deconvoluted into individual processes taking into account the energy band diagram of the semiconductor-electrolyte interface. The deconvolution of the current density transients indicates that Bi electrodeposition follows a 3D nucleation controlled by diffusion, accompanied by concurrent processes such as both proton adsorption and reduction. The competition of these processes is controlled by the energy distribution of the surface states at the semiconductor-electrolyte interface and determines the nucleation process. The correlation between the properties of the Bi films and the Bi/GaAs interface with the nucleation process, i.e., with overpotential, is discussed in detail in Part II of this work.

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On Wetting Angles and Nucleation Energies during the Electrochemical Nucleation of Cobalt onto Glassy Carbon from a Deep Eutectic Solvent

Cited by 34 publications

References 32 publications

Cobalt Electrochemical Recovery from Lithium Cobalt Oxides in Deep Eutectic Choline Chloride+Urea Solvents

Cobalt Electrochemical Recovery from Lithium Cobalt Oxides in Deep Eutectic Choline Chloride+Urea Solvents

Surface Sensitive Nickel Electrodeposition in Deep Eutectic Solvent

Electrodeposition of Bi Thin Films on n-GaAs(111)B. I. Correlation between the Overpotential and the Nucleation Process

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