2012 IEEE Radio Frequency Integrated Circuits Symposium 2012
DOI: 10.1109/rfic.2012.6242312
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On-wafer CMOS transistors de-embedding method using two transmission lines of different lengths

Abstract: By using transmission line measurements of arbitrary characteristic impedance, this paper introduces an alternative method to de-embed parasitic structures such as pads and interconnection lines. The proposed method uses two uniform transmission lines of arbitrary characteristic impedance as calibration standard (L-L method). The two transmission lines have the same characteristic impedance, but different lengths. Experimental S-parameters data of on-wafer CMOS FETs de-embedded with the proposed L-L method, Ma… Show more

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Cited by 7 publications
(9 citation statements)
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“…Figure a shows the de‐embedded S‐parameters of a HVMOS FET at V GS = 3.0 V and V DS = 18.0 V, using and . The transistor is embedded in pads and interconnection lines of 54 μm of length, as depicted in Figure .…”
Section: Resultsmentioning
confidence: 99%
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“…Figure a shows the de‐embedded S‐parameters of a HVMOS FET at V GS = 3.0 V and V DS = 18.0 V, using and . The transistor is embedded in pads and interconnection lines of 54 μm of length, as depicted in Figure .…”
Section: Resultsmentioning
confidence: 99%
“…It is worth to comment that the pads were considered as ABCD matrices to perform the de‐embedded process, this means that in the case of the real part of the shunt admittance was considered negative as shown in Figure c. Now to verify whether a simple shunt admittance can be used as an EEC of the CMOS pad, de‐embedded S‐parameter data of the above transistor computed with and were used to reproduce the original measurement of the HVMOS FET. The characteristic impedance and γ of the interconnection line were computed according to the procedure described in .…”
Section: Resultsmentioning
confidence: 99%
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