On-Wafer Broadband Microwave Measurement of High Impedance Devices-CPW Test Structures with Integrated Metallic Nano-Resistances

Daffe, K.; Mubarak, Faisal; Mascolo, Vincenzo; Votsi, Haris; Ridler, N M; Dambrine, Gilles; Roch‐Jeune, Isabelle; Haddadi, Kamel

doi:10.23919/eumc.2018.8541607

Cited by 2 publications

(1 citation statement)

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“…A typical RF device characterization setup consists of a vector network analyzer (VNA), a probe station with a pair of microwave ground-signal-ground (GSG) probes aligned manually or automatically through a microscope or a camera system onto calibration substrate and test devices [4]. Errors such as drift, stability, and contact repeatability degrade the measurement accuracy, especially as the frequency is raised [5]- [8]. In particular, measurements are sensitive to X, Y, Z, and ϴ positioning of the GSG probe contacts with respect to calibration standards and devices pads [9].…”

Section: Introductionmentioning

confidence: 99%

Impact of GSG Probe to Pads Contact Repeatability for On-Wafer RF Measurements

Mokhtari

Sebbache

Avramovic

et al. 2021

2021 IEEE 7th International Conference on Smart Instrumentation, Measurement and Applications (ICSIMA)

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Improving the contact repeatability for on-wafer measurements is required to address accurate characterization of microwave and millimeter-wave extreme impedance devices foreseen in future RF semi-conductor industry. In this effort, residual error terms introduced by conventional on-wafer probe measurements are quantified in the frequency range 50 MHz -67 GHz. In particular, two sets of measurements considering movements of the probes in the Z-direction only and in X-Y-Z directions are considered. Controlling the probe in the XY axis showed better results in terms of repeatability, more than 10 times à 10 GHz and more than 5 times à 60 GHz. The residual error terms are propagated to determine the measurement uncertainty on the complex impedance of capacitances theoretically tested. Capacitance value of 1 fF measured at 10 GHz was measured with an error around 80 %. Moving the probe on the Z-direction only demonstrated that, if the X and Y movements of the probe are theoretically controlled, the error could be reduced to ~7%. In addition, preliminary design and fabrication of a new compact on-wafer probe station built up with nanorobotics is proposed. Both chuck and RF probes are equipped with nano-positioning stages operating in close loop operation.

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Section: Introductionmentioning

confidence: 99%