Two conflicting requirements occur in the design of plasma-cathode electron sources, both of which need to be met simultaneously. In order to ensure the required emission current density, adequate plasma density must be attained, for which efficient ionization in the plasma near the emission boundary must be provided. On the other hand, accelerating the electron beam to the required energy calls for the application of high voltage in the region of electron-beam formation and acceleration; this in turn necessitates decreasing the ionization processes that can cause breakdown within the acceleration gap. High electric field in the acceleration gap is needed to provide the electron energy, but this same high field can cause breakdown in the gap. This problem can be solved by establishing a pressure difference between the plasma generation region and the electron extraction region. This is possible, however, only for the case of a relatively small plasma emission surface area, e.g., for small-area focused electron beams. For large-cross-section electron beams or electron beams generated at fore-vacuum pressures, it is difficult or almost impossible to produce such a pressure difference. In this case the choice of an appropriate discharge system that is capable of providing conditions for efficient generation of electrons in the plasma and their stable extraction is likely to be the only way for successful operation of a plasma-cathode electron source.The discharge employed in plasma-cathode electron sources must provide generation of dense plasma in the region of electron extraction, at the lowest possible pressure. From this standpoint the most suitable kinds of plasma sources are the hollow-cathode glow discharge, discharges in crossed electric and magnetic fields, such as Penning or cylindrical magnetron discharges, the constricted arc discharge, and the vacuum arc. Note that for most plasma cathodes, two different discharge systems are combined into a single device. For instance, one of the discharges (the main discharge) is used to produce the emissive plasma and the other (the auxiliary discharge) is employed to initiate and sustain the main discharge. Let us briefly consider the peculiarities of each of the discharge systems that are most commonly employed in plasma-cathode electron sources.