2012
DOI: 10.1109/ted.2012.2184545
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On the Switching Parameter Variation of Metal-Oxide RRAM—Part I: Physical Modeling and Simulation Methodology

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Cited by 321 publications
(207 citation statements)
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“…where e R 0 tunnel is the tunnel coupling strength between a trap and an electrode, N L,R is the number of states at a given energy in an electrode and E v þ /E v • are the energy of an empty/ filled trap given by Guan et al [6]:…”
Section: Trap-assisted-tunnelling Modelmentioning
confidence: 99%
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“…where e R 0 tunnel is the tunnel coupling strength between a trap and an electrode, N L,R is the number of states at a given energy in an electrode and E v þ /E v • are the energy of an empty/ filled trap given by Guan et al [6]:…”
Section: Trap-assisted-tunnelling Modelmentioning
confidence: 99%
“…T n L,R,þ• is the tunnel probability from the left/right electrode into a trap given by the WentzelKramers-Brilloin approximation [6]:…”
Section: Trap-assisted-tunnelling Modelmentioning
confidence: 99%
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“…The unique properties of the memristor can be beneficial for many applications, such as threshold switch [3], dynamic load [4] and memory, which is considered the primary application for these devices. Resistive random-access memory [5][6][7][8][9][10][11] is one interesting type of memristive device [12]. Unlike standard nonvolatile memory cells such as Flash, resistive random-access memory can be smaller, vertically stacked (three-dimensional crossbar array structures [13,14]), with lower energy and lower read/write latency [15][16][17].…”
Section: Introductionmentioning
confidence: 99%