1990
DOI: 10.1016/0921-4534(90)90641-q
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On the optimization of the laser ablation process for the deposition of YBa2Cu3O7− thin films

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Cited by 40 publications
(9 citation statements)
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“…The rate of deposition, as well as the temperature, has a strong influence on the film microstructure [74] because it determines the rate of nucleation. For a given substrate temperature, a lower deposition rate will result in a lower rate of nucleation and a longer mean free diffusion time of mobile atoms on the surface.…”
Section: Thin-film Deposition Methodsmentioning
confidence: 99%
“…The rate of deposition, as well as the temperature, has a strong influence on the film microstructure [74] because it determines the rate of nucleation. For a given substrate temperature, a lower deposition rate will result in a lower rate of nucleation and a longer mean free diffusion time of mobile atoms on the surface.…”
Section: Thin-film Deposition Methodsmentioning
confidence: 99%
“…In the years that followed, a lot of attention was paid to the nature of the laser-target interaction and the influence of the laser parameters on the quality of the thin films. For example, in the table taken from Norton et al [4], it can be seen how the different parameter settings were prioritised in terms of their role in the formation of an epitaxial, crystalline film (Table 1).…”
Section: Introductionmentioning
confidence: 99%
“…While the substrate temperature mainly affects the amorphous or crystalline character and the grain size of the deposited film, 2,3 the laser energy density together with the gas pressure determines the microstructure, composition, and lateral distribution of the deposited film. [2][3][4] Both the nature of the laser-generated plasma and the deposition atmosphere significantly influence the film characteristics. 5,6 A further understanding of the plasma processes, in addition to its intrinsic interest, opens the way to reliable control of the film deposition process.…”
Section: Introductionmentioning
confidence: 99%