On the nature of defects created on graphene by scanning probe lithography under ambient conditions

Chien, Hsiao Mei; Chuang, Min Chiang; Tsai, Hung Chieh; Shiu, Hung-Wei; Chang, Lo Yueh; Chen, Chia Hao; Lee, Sheng Wei; White, J. D.; Woon, Wei Yen

doi:10.1016/j.carbon.2014.08.070

Cited by 15 publications

(22 citation statements)

References 45 publications

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“…[88,89] In contrast to the reduction approach, by applying a negative bias voltage to the AFM tip to locally oxidize graphene due to the absorbed water, the GO patterns can be inserted in graphene flakes (Figure 7). [90][91][92] Upon following this strategy, sub-20 nm GO patterns were prepared on epitaxial graphene by Garcia recently. [93] More recently, Pingue and coworkers provided insight into the influence of negative bias voltages on the GO patterning preparation, indicating that an enhanced-oxidation will damage graphene layer.…”

Section: Other Lithographic Methodsmentioning

confidence: 99%

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Recent Advances in Graphene Patterning

et al. 2020

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As an emerging field of research, graphene patterning has received considerable attention because of its ability to tailor the structure of graphene and the respective properties, aiming at practical applications such as electronic devices, catalysts, and sensors. Recent efforts in this field have led to the development of a variety of different approaches to pattern graphene sheets, providing a multitude of graphene patterns with different shapes and sizes. These established patterning techniques in combination with graphene chemistry have paved the road towards highly attractive chemical patterning approaches, establishing a very promising and vigorously developing research topic. In this review, an overview of commonly used strategies is presented that are categorized into top‐down and bottom‐up routes for graphene patterning, focusing mainly on new advances. Other than the introduction of basic concepts of each method, the advantages/disadvantages are compared as well. In addition, for the first time, an overview of chemical patterning techniques is outlined. At the end, the challenges and future perspectives in the field are envisioned.

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Section: Other Lithographic Methodsmentioning

confidence: 99%

“…Schematic illustration for the fabrication of GO patterns through oxidation SPL. Reproduced from ref [92]. with permission.…”

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confidence: 99%

Recent Advances in Graphene Patterning

et al. 2020

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“…Recently, micro-Raman and X-ray spectroscopy have been applied to characterize submicrometer o-SPL patterns on graphene [23,24]. However, there are no studies on the chemical and the structural properties of those nanopatterns that have the spatial resolution relevant for the development of high-performance devices.…”

Section: Introductionmentioning

confidence: 99%

Chemical and structural analysis of sub-20 nm graphene patterns generated by scanning probe lithography

Dago

Sangiao

Fernández-Pacheco

et al. 2018

Carbon

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Sub-20 nm patterns have been fabricated by using oxidation scanning probe lithography on epitaxial graphene. The structural and chemical properties of these nanopatterns have been characterized by high resolution transmission electron microscopy, energy dispersive X-ray spectroscopy and electron energy loss spectroscopy. The electron microscopy images reveal that the nanolithography process modifies the graphene monolayer and a thin region of the SiC substrate (1 nm thick). Spatially-resolved electron spectroscopies show that the nanopatterns are made of graphene oxide. The combination of spatially-resolved structural and chemical analysis of graphene nanopatterns will enable the development of highperformance graphene devices.

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“…One method of altering 17 the abovementioned physical and chemical properties, and possibly enhancing them, consists of studying a graphene layer with impurities or defects such as adatoms, dislocations or vacancies. There are many ways to produce defects on a sample, 18,19 but a simple and efficient way to produce them in a controlled manner is by ion bombardment. For these methods to be efficient and feasible, it is important to understand the type of defects produced under the different irradiation conditions such as the irradiation type (electrons or ions), temperature, energy and dose.…”

Section: Introductionmentioning

confidence: 99%

Controlled rippling of graphene via irradiation and applied strain modify its mechanical properties: a nanoindentation simulation study

Martinez-Asencio

Ruestes

Bringa

et al. 2016

Phys. Chem. Chem. Phys.

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Ripples present in free standing graphene have an important influence on the mechanical behavior of this two-dimensional material. In this study, we show through nanoindentation simulations, how out-of-plane displacements can be modified by strain, resulting in softening of the membrane under compression and stiffening under tension. Irradiation also induces changes in the mechanical properties of graphene. Interestingly, compressed samples, irradiated at low doses are stiffened by the irradiation, whereas the samples under tensile strain do not show significant changes in their mechanical properties. These simulations indicate that vacancies produced by the energetic ions cannot be the ones directly responsible for this behavior. However, changes in roughness induced by the momentum transferred from the energetic ions to the membrane, can explain these differences. These results provide an alternative explanation to recent experimental observations of the stiffening of graphene under low dose irradiation, as well as the paths to tailor the mechanical properties of this material via applied strain and irradiation.

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On the nature of defects created on graphene by scanning probe lithography under ambient conditions

Cited by 15 publications

References 45 publications

Recent Advances in Graphene Patterning

Recent Advances in Graphene Patterning

Chemical and structural analysis of sub-20 nm graphene patterns generated by scanning probe lithography

Controlled rippling of graphene via irradiation and applied strain modify its mechanical properties: a nanoindentation simulation study

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