Chemical and structural analysis of sub-20 nm graphene patterns generated by scanning probe lithography

Dago, Arancha I.; Sangiao, Soraya; Fernández-Pacheco, Rodrigo; García, Ricardo García

doi:10.1016/j.carbon.2017.12.033

Cited by 17 publications

(14 citation statements)

References 36 publications

(36 reference statements)

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Besides the observation of AB interferences in these structural defective systems, we will additionally demonstrate that the approach presented in this work can also be extended to graphene systems containing two parallel graphenic barriers with functional impurities, particularly, including oxygen impurities, which can be experimentally achieved as in refs. [44][45][46][47][48][49][50].…”

Section: Introductionmentioning

confidence: 99%

Aharonov–Bohm interferences in polycrystalline graphene

Nguyễn

Charlier

2020

Nanoscale Adv.

View full text Add to dashboard Cite

Aharonov-Bohm (AB) interferences in the quantum Hall regime can be achieved, provided that electrons are able to transmit between two edge channels in nanostructures. Pioneering approaches include quantum point contacts in 2DEG systems, bipolar graphene p-n junctions, and magnetic field heterostructures. In this work, defect scattering is proposed as an alternative mechanism to achieve AB interferences in polycrystalline graphene. Indeed, due to such scattering, the extended defects across the sample can act as tunneling paths connecting quantum Hall edge channels. Consequently, strong AB oscillations in the conductance are predicted in polycrystalline graphene systems with two parallel grain boundaries. In addition, this general approach is demonstrated to be applicable to nano-systems containing two graphene barriers with functional impurities and perspectively, can also be extended to similar systems of 2D materials beyond graphene. arXiv:1908.09399v1 [cond-mat.mes-hall]

show abstract

Section: Introductionmentioning

confidence: 99%

Aharonov–Bohm interferences in polycrystalline graphene

Nguyễn

Charlier

2020

Nanoscale Adv.

View full text Add to dashboard Cite

show abstract

“…[90][91][92] Upon following this strategy, sub-20 nm GO patterns were prepared on epitaxial graphene by Garcia recently. [93] More recently, Pingue and coworkers provided insight into the influence of negative bias voltages on the GO patterning preparation, indicating that an enhanced-oxidation will damage graphene layer. [94]…”

Section: Other Lithographic Methodsmentioning

confidence: 99%

Recent Advances in Graphene Patterning

et al. 2020

View full text Add to dashboard Cite

As an emerging field of research, graphene patterning has received considerable attention because of its ability to tailor the structure of graphene and the respective properties, aiming at practical applications such as electronic devices, catalysts, and sensors. Recent efforts in this field have led to the development of a variety of different approaches to pattern graphene sheets, providing a multitude of graphene patterns with different shapes and sizes. These established patterning techniques in combination with graphene chemistry have paved the road towards highly attractive chemical patterning approaches, establishing a very promising and vigorously developing research topic. In this review, an overview of commonly used strategies is presented that are categorized into top‐down and bottom‐up routes for graphene patterning, focusing mainly on new advances. Other than the introduction of basic concepts of each method, the advantages/disadvantages are compared as well. In addition, for the first time, an overview of chemical patterning techniques is outlined. At the end, the challenges and future perspectives in the field are envisioned.

show abstract

“…This allowed for the preparation of GO patterns on a graphene film ( Figure ). [ 87 ] In a typical procedure, the as‐prepared graphene sheet was deposited on a substrate, followed by depositing metal electrodes on the graphene surface. Afterward, the AFM tip was negatively biased with respect to the graphene (which was electrically grounded), whereby the graphene area contacted by the tip was oxidized, whereas the other regions remained intact.…”

Section: Top‐down Routementioning

confidence: 99%

Evolution of Graphene Patterning: From Dimension Regulation to Molecular Engineering

2021

View full text Add to dashboard Cite

The realization that nanostructured graphene featuring nanoscale width can confine electrons to open its bandgap has aroused scientists’ attention to the regulation of graphene structures, where the concept of graphene patterns emerged. Exploring various effective methods for creating graphene patterns has led to the birth of a new field termed graphene patterning, which has evolved into the most vigorous and intriguing branch of graphene research during the past decade. The efforts in this field have resulted in the development of numerous strategies to structure graphene, affording a variety of graphene patterns with tailored shapes and sizes. The established patterning approaches combined with graphene chemistry yields a novel chemical patterning route via molecular engineering, which opens up a new era in graphene research. In this review, the currently developed graphene patterning strategies is systematically outlined, with emphasis on the chemical patterning. In addition to introducing the basic concepts and the important progress of traditional methods, which are generally categorized into top‐down, bottom‐up technologies, an exhaustive review of established protocols for emerging chemical patterning is presented. At the end, an outlook for future development and challenges is proposed.

show abstract

Chemical and structural analysis of sub-20 nm graphene patterns generated by scanning probe lithography

Cited by 17 publications

References 36 publications

Aharonov–Bohm interferences in polycrystalline graphene

Aharonov–Bohm interferences in polycrystalline graphene

Recent Advances in Graphene Patterning

Evolution of Graphene Patterning: From Dimension Regulation to Molecular Engineering

Contact Info

Product

Resources

About