2020
DOI: 10.3390/nano10112214
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On the Formation of Black Silicon Features by Plasma-Less Etching of Silicon in Molecular Fluorine Gas

Abstract: In this paper, we study the plasma-less etching of crystalline silicon (c-Si) by F2/N2 gas mixture at moderately elevated temperatures. The etching is performed in an inline etching tool, which is specifically developed to lower costs for products needing a high volume manufacturing etching platform such as silicon photovoltaics. Specifically, the current study focuses on developing an effective front-side texturing process on Si(100) wafers. Statistical variation of the tool parameters is performed to achieve… Show more

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Cited by 11 publications
(12 citation statements)
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“…The single-sided etching process is performed using the ADE tool, which previously has been used extensively for etching and texturing of crystalline silicon (c-Si) surfaces. [14] The schematic of the process is shown in Figure 1.…”
Section: Etching Toolmentioning
confidence: 99%
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“…The single-sided etching process is performed using the ADE tool, which previously has been used extensively for etching and texturing of crystalline silicon (c-Si) surfaces. [14] The schematic of the process is shown in Figure 1.…”
Section: Etching Toolmentioning
confidence: 99%
“…More details about the etching tool and its use in c-Si etching can be read in previous studies. [14][15][16]…”
Section: Etching Toolmentioning
confidence: 99%
See 3 more Smart Citations