On Some Unique Specificities of Ge‐Rich GeSbTe Phase‐Change Material Alloys for Nonvolatile Embedded‐Memory Applications

Luong, Minh Anh; Agati, Marta; Ramond, Nicolas Ratel; Grisolia, J.; Friec, Y. Le; Benoît, Daniel; Claverie, A.

doi:10.1002/pssr.202000471

Cited by 11 publications

(24 citation statements)

References 64 publications

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“…For instance, in the real samples, Ge could migrate to enrich the amorphous region surrounding the crystallizing region depleted in Ge. The crystallization of Ge inside the further Ge enriched amorphous region will occur at a later stage or at higher temperature [ 26 ].…”

Section: Discussionmentioning

confidence: 99%

“…In fact, the segregation phenomena require long length diffusion of the atomic species, which would imply a longer incubation time for the formation of supercritical crystalline nuclei. This process was reported in the crystallization of the as-deposited amorphous films and during forming (initialization) of the memory cells [ 17 , 18 , 22 , 23 , 24 , 25 , 26 ]. The presence of a reversible phase separation during set/reset is instead less clear.…”

Section: Introductionmentioning

confidence: 99%

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High-Throughput Calculations on the Decomposition Reactions of Off-Stoichiometry GeSbTe Alloys for Embedded Memories

Kheir

Bernasconi

2021

Nanomaterials

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Chalcogenide GeSbTe (GST) alloys are exploited as phase change materials in a variety of applications ranging from electronic non-volatile memories to neuromorphic and photonic devices. In most applications, the prototypical Ge2Sb2Te5 compound along the GeTe-Sb2Te3 pseudobinary line is used. Ge-rich GST alloys, off the pseudobinary tie-line with a crystallization temperature higher than that of Ge2Sb2Te5, are currently explored for embedded phase-change memories of interest for automotive applications. During crystallization, Ge-rich GST alloys undergo a phase separation into pure Ge and less Ge-rich alloys. The detailed mechanisms underlying this transformation are, however, largely unknown. In this work, we performed high-throughput calculations based on Density Functional Theory (DFT) to uncover the most favorable decomposition pathways of Ge-rich GST alloys. The knowledge of the DFT formation energy of all GST alloys in the central part of the Ge-Sb-Te ternary phase diagram allowed us to identify the cubic crystalline phases that are more likely to form during the crystallization of a generic GST alloy. This scheme is exemplified by drawing a decomposition map for alloys on the Ge-Ge1Sb2Te4 tie-line. A map of decomposition propensity is also constructed, which suggests a possible strategy to minimize phase separation by still keeping a high crystallization temperature.

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Section: Discussionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

High-Throughput Calculations on the Decomposition Reactions of Off-Stoichiometry GeSbTe Alloys for Embedded Memories

Kheir

Bernasconi

2021

Nanomaterials

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“…Other issues, such as void formation and electromigration, have also been reported [ 7 , 8 ]. In addition, the low crystallization temperature of GST225 (≈150 °C) limits the material’s potential for automotive and aeronautics applications [ 9 ]. Simply put, GST225 could not meet the automotive specifications and soldering threshold needed in embedded memory applications [ 10 , 11 ].…”

Section: Introductionmentioning

confidence: 99%

“…Increasing the Ge content in the GST alloys shows an increase in the crystallization temperature, promoting high data retention and endurance [ 10 , 21 , 22 ]. Moreover, in addition to Ge enriching, nitrogen doping of Ge-rich GST alloys has also been studied for increased thermal stability and higher crystallization temperatures, which are attractive for future memory devices [ 9 , 23 , 24 ].…”

Section: Introductionmentioning

confidence: 99%

Phase Separation in Ge-Rich GeSbTe at Different Length Scales: Melt-Quenched Bulk versus Annealed Thin Films

et al. 2022

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Integration of the prototypical GeSbTe (GST) ternary alloys, especially on the GeTe-Sb2Te3 tie-line, into non-volatile memory and nanophotonic devices is a relatively mature field of study. Nevertheless, the search for the next best active material with outstanding properties is still ongoing. This search is relatively crucial for embedded memory applications where the crystallization temperature of the active material has to be higher to surpass the soldering threshold. Increasing the Ge content in the GST alloys seems promising due to the associated higher crystallization temperatures. However, homogeneous Ge-rich GST in the as-deposited condition is thermodynamically unstable, and phase separation upon annealing is unavoidable. This phase separation reduces endurance and is detrimental in fully integrating the alloys into active memory devices. This work investigated the phase separation of Ge-rich GST alloys, specifically Ge5Sb2Te3 or GST523, into multiple (meta)stable phases at different length scales in melt-quenched bulk and annealed thin film. Electron microscopy-based techniques were used in our work for chemical mapping and elemental composition analysis to show the formation of multiple phases. Our results show the formation of alloys such as GST213 and GST324 in all length scales. Furthermore, the alloy compositions and the observed phase separation pathways agree to a large extent with theoretical results from density functional theory calculations.

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“…Carbon [12], oxygen [13], bismuth [14] and antimony [15] have been reported to increase the crystallization temperature of GST-225. Doping with a few percent of nitrogen is also appealing because it represents an effective way to achieve much higher crystallization temperatures (T x ) [16][17][18][19], increased resistivity of both the crystalline and amorphous states while maintaining a high contrast [20][21][22][23][24], and a reduced resistivity drift of the RESET state [25,26]. Moreover, N has also been shown to render the transition from the amorphous to the crystalline states more progressive, giving more precise access to intermediate resistivity states between the RESET and SET values [21].…”

Section: Introductionmentioning

confidence: 99%

Effect of Nitrogen Doping on the Crystallization Kinetics of Ge2Sb2Te5

et al. 2021

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Among the phase change materials, Ge2Sb2Te5 (GST-225) is the most studied and is already integrated into many devices. N doping is known to significantly improve some key characteristics such as the thermal stability of materials and the resistance drift of devices. However, the origin, at the atomic scale, of these alterations is rather elusive. The most important issue is to understand how N doping affects the crystallization characteristics, mechanisms and kinetics, of GST-225. Here, we report the results of a combination of in situ and ex situ transmission electron microscopy (TEM) investigations carried out on specifically designed samples to evidence the influence of N concentration on the crystallization kinetics and resulting morphology of the alloy. Beyond the known shift of the crystallization temperature and the observation of smaller grains, we show that N renders the crystallization process more “nucleation dominated” and ascribe this characteristic to the increased viscosity of the amorphous state. This increased viscosity is linked to the mechanical rigidity and the reduced diffusivity resulting from the formation of Ge–N bonds in the amorphous phase. During thermal annealing, N hampers the coalescence of the crystalline grains and the cubic to hexagonal transition. Making use of AbStrain, a recently invented TEM-based technique, we evidence that the nanocrystals formed from the crystallization of N-doped amorphous GST-225 are under tension, which suggests that N is inserted in the lattice and explains why it is not found at grain boundaries. Globally, all these results demonstrate that the origin of the effect of N on the crystallization of GST-225 is not attributed to the formation of a secondary phase such as a nitride, but to the ability of N to bind to Ge in the amorphous and crystalline phases and to unbind and rebind with Ge along the diffusion path of this atomic species during annealing.

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On Some Unique Specificities of Ge‐Rich GeSbTe Phase‐Change Material Alloys for Nonvolatile Embedded‐Memory Applications

Cited by 11 publications

References 64 publications

High-Throughput Calculations on the Decomposition Reactions of Off-Stoichiometry GeSbTe Alloys for Embedded Memories

High-Throughput Calculations on the Decomposition Reactions of Off-Stoichiometry GeSbTe Alloys for Embedded Memories

Phase Separation in Ge-Rich GeSbTe at Different Length Scales: Melt-Quenched Bulk versus Annealed Thin Films

Effect of Nitrogen Doping on the Crystallization Kinetics of Ge2Sb2Te5

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