“…It was not until the 1950s, supported by mass spectrometry studies, 44,45 that the halogenated molecules' ability to effectively attach free electrons became generally recognized as responsible for the small first Townsend coefficient and the high electric strength of halogenated gases. 46,47 It was found that negative ions are created by the two-body process of dissociative attachment such as in CCl 4 , 47 SF 6 , 47,48 and trifluoroiodomethane CF 3 I 30 or by the three-body process of electron attachment where a dissociation process does not occur. 48,49 From all halogenated substances, SF 6 turned out to be the best insulation gas in terms of stability, toxicity, and liquefaction temperature, although other gases revealed higher electric strengths.…”