2008
DOI: 10.1063/1.2840182
|View full text |Cite
|
Sign up to set email alerts
|

Ohmic conduction of sub-10nm P-doped silicon nanowires at cryogenic temperatures

Abstract: We investigate the conduction properties of an embedded, highly phosphorus-doped nanowire with a width of 8nm lithographically defined by scanning tunneling microscope based patterning of a hydrogen-terminated Si(100):H surface. Four terminal I-V measurements show that ohmic conduction is maintained within the investigated temperature range from 35K down to 1.3K. A prominent resistance increase is observed below ∼4K which is attributed to a crossover into the strong localization regime. The low temperature con… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4
1

Citation Types

1
8
0

Year Published

2008
2008
2017
2017

Publication Types

Select...
8

Relationship

1
7

Authors

Journals

citations
Cited by 12 publications
(9 citation statements)
references
References 19 publications
1
8
0
Order By: Relevance
“…A requirement34 for the application of VRH theory is that ( T 0 / T ) ≫1. For the native processed PEDOT:PSS and temperature range studied in this paper ( T 0 / T ) = 4−16, which is in agreement with observations of other quasi‐1D VRH systems 4, 27, 35–37. A more detailed investigation of α yields that the data is best described by α = 0.45 ± 0.05, where α decreases slightly with temperature.…”
Section: Resultssupporting
confidence: 89%
“…A requirement34 for the application of VRH theory is that ( T 0 / T ) ≫1. For the native processed PEDOT:PSS and temperature range studied in this paper ( T 0 / T ) = 4−16, which is in agreement with observations of other quasi‐1D VRH systems 4, 27, 35–37. A more detailed investigation of α yields that the data is best described by α = 0.45 ± 0.05, where α decreases slightly with temperature.…”
Section: Resultssupporting
confidence: 89%
“…This is motivated by their com-patibility with the current industrial information technology processing, [14] and with state-of-the-art nanoscale processing techniques. [15] Another reason is the energy gap at the Fermi level allowing to decouple the nanowire and substrate electronic states, which is paramount to obtaining 1D isolated nanowires on a bulk substrate. A range of metal atoms have been self-assembled into atomic chains on vicinal Si(553) and Si(557) surfaces, [16,17] and on Si(111) and Ge(001) terraces.…”
Section: Introductionmentioning
confidence: 99%
“…A key development in the ongoing transformation of the doping of silicon from a random process to a deterministic one has been the discovery that individual phosphorus atoms can be positioned on silicon surfaces with atomic precision by means of scanning tunnelling microscopy (STM) [1][2][3] and buried beneath controllable depths of silicon. This has opened the way to the fabrication of atomically patterned dopant devices beyond simple δ-doped layers, 4,5 to quantum atomic-scale nanowires, [6][7][8] quantum dots, 9 and a single-dopant singleelectron transistor, 10 all of which are formed from buried dopants within ∼25 nm of the surface. It also holds potential for the realisation of theoretical proposals to process quantum information encoded in the impurity spin states using either electrical 11 or optical 12,13 control of the donor wavefunctions.…”
Section: Introductionmentioning
confidence: 99%
“…This has opened the way to the fabrication of atomically patterned dopant devices beyond simple δ-doped layers [4,5] to quantum atomic-scale nanowires [6][7][8], quantum dots [9], and a single-dopant singleelectron transistor [10], all of which are formed from buried dopants within ∼25 nm of the surface. It also holds potential for the realization of theoretical proposals to process quantum information encoded in the impurity spin states using either electrical [11] or optical [12,13] control of the donor wave functions.…”
Section: Introductionmentioning
confidence: 99%