Abstract:In this work, in situ non-perturbing method of optical emission spectroscopy is used to examine the features of the emission spectra of NF3/Xe plasma, which can be used for the process of continuous plasma-chemical etching of lithium niobate. To understand the physicochemical processes occurring in plasma, the influence of high-frequency power, pressure in the chamber, bias voltage and substrate temperature on the emission intensities of the F, N, Xe lines was studied. It was determined that increasing the bia… Show more
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