2010
DOI: 10.1109/ted.2010.2057251
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Observation of Slow Oxide Traps at MOSFETs Having Metal/High-k Gate Dielectric Stack in Accumulation Mode

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Cited by 7 publications
(9 citation statements)
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“…2a, the capturing time constant τ c starts to dominate over the emitting time constant τ e . This agrees with the behaviour detected in the CMOS gate oxide traps [3,5]. As the biasing voltage continues to increase, AlGaN/GaN RTS noise tends to be more prominent, whereas the oxide RTS noise starts to be masked out by the background noise.…”
Section: Device Structure and Characterisation Setupsupporting
confidence: 89%
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“…2a, the capturing time constant τ c starts to dominate over the emitting time constant τ e . This agrees with the behaviour detected in the CMOS gate oxide traps [3,5]. As the biasing voltage continues to increase, AlGaN/GaN RTS noise tends to be more prominent, whereas the oxide RTS noise starts to be masked out by the background noise.…”
Section: Device Structure and Characterisation Setupsupporting
confidence: 89%
“…2a the gate biasing voltage is -8 V and the time scale is of milliseconds range. The drain current I D now falls within two distinct levels due to the random capturing and emitting processes of the gate dielectric traps, and the phenomenon is similar to that observed in silicon MOSFETs [3,5]. When the gate bias is increased to -7.7 V, RTS noise with wider pulses and a longer period are noted, as is seen in Fig.…”
Section: Device Structure and Characterisation Setupsupporting
confidence: 73%
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“…1-4 Especially, random telegraph noise ͑RTN͒ due to the trapping and detrapping of a carrier in gate dielectric trap is dominant in the lowfrequency noise of small metal-oxide-semiconductor field effect transistor ͑MOSFET͒ devices. [5][6][7][8][9][10][11][12][13] The gate current ͑I G ͒ RTN in high-k MOSFETs was reported. 10,11 However, these studies have been conducted only in the inversion mode.…”
mentioning
confidence: 99%
“…The I G -RTN under accumulation mode was studied. 12 But the gate edge current between the gate and the drain ͑or source͒ was not separated from the I G which includes the gate edge current and the tunneling current between the gate and the body. The RTN in the gate edge current was reported.…”
mentioning
confidence: 99%