Current leakage sites in diamond p-n junction are determined by measuring an electron-beam-induced current (EBIC) technique and conductive atomic force microscopy (C-AFM). Current leakage sites in p-n diodes, particularly, can be determined by means of EBIC without destruction of the device structure. From EBIC observation, bright spots with higher signal intensity than these in surrounding region are observed in p-n diodes, and these spots strongly correlate with the leakage current. It is found that these bright spots are originating from pits of comet-shaped defects observed by a scanning electron microscope. With C-AFM, the leakage current is detected at pits of comet-shaped defects. Reduction in comet-shaped defects shall be reduced using the technique of reduction in dislocation and high-quality crystal growth to suppress the leakage current.