2010
DOI: 10.1103/physrevb.81.115425
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Oblique incidence deposition of Cu/Cu(001): Enhanced roughness and ripple formation

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Cited by 6 publications
(6 citation statements)
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“…It has been shown that the epitaxial growth of metal thin films in the oblique incidence geometry results in increased surface roughness and formation of mounds, the shape of which depends on the deposition angle, temperature and the thickness of the film. [39][40][41] For deposition angles beyond 50 • off the surface normal a phenomenon named steering was suggested by Dijken et al 39 . It was used to explain the increased deposition flux on top of surface protrusions observed for Cu/Cu(001).…”
Section: Au Segregation During Annealingmentioning
confidence: 95%
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“…It has been shown that the epitaxial growth of metal thin films in the oblique incidence geometry results in increased surface roughness and formation of mounds, the shape of which depends on the deposition angle, temperature and the thickness of the film. [39][40][41] For deposition angles beyond 50 • off the surface normal a phenomenon named steering was suggested by Dijken et al 39 . It was used to explain the increased deposition flux on top of surface protrusions observed for Cu/Cu(001).…”
Section: Au Segregation During Annealingmentioning
confidence: 95%
“…It was used to explain the increased deposition flux on top of surface protrusions observed for Cu/Cu(001). 39,41 Due to the islands and steps present on the substrate surface, the attractive potential between the incident atoms and the substrate is distorted and causes changes of the trajectories of the incident atoms. As a result, the incident flux is increased on top of protruding terraces and decreased behind descending steps.…”
Section: (A and B)mentioning
confidence: 99%
“…This oblique incidence could lead with increasing deposition time to the formation of ripples perpendicular the direction of the vapor beam that would introduce some shape anisotropy with the easy axis along the ripple direction [38,39]. However, we can rule out such oblique incidence growth-induced ripple morphology here as the origin of the [110]-oriented magnetization in thick films ( 8 ML) because domains with an easy axis along the [110] axis, orthogonal to the easy axis shown in Figs.…”
Section: A Room Temperature Growthmentioning
confidence: 99%
“…These barriers were determined by a combination of simulations and helium diffraction experiments [37]. The resulting morphologies after multilayer growth were compared to experimental data from both STM (Stoian [84]) and HR-LEED (Rabbering [79]) and were found to be in good agreement [78]. As an illustration, figure 7.2 shows characteristic simulated morphologies and STM images obtained in homoepitaxy experiments for the growth of 40ML of Cu on Cu(001) at grazing incidence (80 • ) and at a temperature of 270, 250 and 220/230K.…”
Section: Resultsmentioning
confidence: 83%
“…Initially it was thought that this anisotropy was solely the result of the shadowing effect caused by surface features blocking some trajectories of incoming atoms. Experimental studies [29,[71][72][73][74][75][76][77][78] however, show that this anisotropic growth mode is not only caused by the shadowing effect, but initiated by an attractive force between surface and incoming atoms. This leads to a heterogeneity in the incident flux: local indentations receive relatively little flux, while more flux is directed to protrusions.…”
Section: Resultsmentioning
confidence: 99%