2017
DOI: 10.1103/physrevb.95.064404
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Fe on W(001) from continuous films to nanoparticles: Growth and magnetic domain structure

Abstract: The evolution of the structural and magnetic properties of Fe films during growth on the W(001) surface have been studied with low energy electron diffraction, real-time low energy electron microscopy, and quasi-real-time, spin-polarized low energy electron microscopy in the absence of a magnetic field (virgin state). Depending on the growth temperature, different growth modes are observed: growth of atomically rough and highly strained (10.4% tensile) pseudomorphic films at room temperature, kinetically limit… Show more

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Cited by 12 publications
(5 citation statements)
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References 45 publications
(159 reference statements)
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“…When the threshold is exceeded, the coercive force increases as the film thickness increases; Tripathi et al's study further verified this conclusion [20]. Regarding the research on iron thin films, most of them focus on the deposition time (thickness) [21], growth temperature [22], substrate selection, etc. There are few reports pertaining to the influence of the sputtering power on the structure, morphology and magnetic properties of iron thin films [17,23].…”
Section: Introductionmentioning
confidence: 90%
“…When the threshold is exceeded, the coercive force increases as the film thickness increases; Tripathi et al's study further verified this conclusion [20]. Regarding the research on iron thin films, most of them focus on the deposition time (thickness) [21], growth temperature [22], substrate selection, etc. There are few reports pertaining to the influence of the sputtering power on the structure, morphology and magnetic properties of iron thin films [17,23].…”
Section: Introductionmentioning
confidence: 90%
“…The growth of Fe/W(001) films has been studied by a number of groups. [23][24][25][26][27] After some initial uncertainty, it has been established that 2ML of Fe on W(001) are thermally stable up to 700 K, whereas thicker films are stable to lower temperatures. This permits a straightforward thickness calibration of films grown by evaporation in UHV using the Auger electron spectroscopy (AES) signal from the W substrate during deposition.…”
Section: Experimental Methodsmentioning
confidence: 99%
“…can be related to the familiar Hamaker constant A H : p ∼ A H /12πs 2 , where A H ∼ 10 −14 − 10 −12 erg [31], and s ∼ 10 −7 cm [32,34]. This gives p…”
Section: Thus All Primary (H Cmentioning
confidence: 99%