2019
DOI: 10.1016/j.cap.2019.05.002
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Oblique angle deposition of nanocolumnar TiZrN films via reactive magnetron co-sputtering technique: The influence of the Zr target powers

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Cited by 27 publications
(9 citation statements)
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“…Unlike this situation with electrodes prepared with chemical methods, MS permits the preparation of thin films with different oxidation states but similar microstructures, thus providing a unique way to determine the best layer characteristics for the OER. Since an efficient control of the film microstructure during MS growth can be achieved varying the geometry of the deposition, very porous and nanocolumnar electrodes have been prepared by oblique angle deposition (OAD). Meanwhile, the chemistry of the deposits, from metal to oxide or oxyhydroxide, has been controlled by modifying the composition of the gas mixture in the magnetron plasma discharge . Thanks to the capacity to reproduce similar microstructures for different compositions of the nickel phase, we have customized the nickel anode composition and layer distribution (metal, oxide, or oxyhydroxide phases within monolayer or bilayer structures) to determine the best anode configuration/chemical state to maximize the OER yield.…”
Section: Introductionmentioning
confidence: 99%
“…Unlike this situation with electrodes prepared with chemical methods, MS permits the preparation of thin films with different oxidation states but similar microstructures, thus providing a unique way to determine the best layer characteristics for the OER. Since an efficient control of the film microstructure during MS growth can be achieved varying the geometry of the deposition, very porous and nanocolumnar electrodes have been prepared by oblique angle deposition (OAD). Meanwhile, the chemistry of the deposits, from metal to oxide or oxyhydroxide, has been controlled by modifying the composition of the gas mixture in the magnetron plasma discharge . Thanks to the capacity to reproduce similar microstructures for different compositions of the nickel phase, we have customized the nickel anode composition and layer distribution (metal, oxide, or oxyhydroxide phases within monolayer or bilayer structures) to determine the best anode configuration/chemical state to maximize the OER yield.…”
Section: Introductionmentioning
confidence: 99%
“…Combining oblique angle geometries and sputter-deposition technique provides additional degree of freedom to adjust the film morphological features (porosity and column tilt angle) and stoichiometry by varying the deposition pressure or target power [7][8][9][10][11] and employing more than one material source [12][13][14][15]. However, studies on transition metal nitride (TMN) films produced at OAD or GLAD conditions remain relatively underexplored [16][17][18][19][20][21]. Long-used as protective hard coatings, for which achieving a dense and compact microstructure is a pre-requisite, TMN are foreseen as promising candidate materials for plasmonic and sensing applications [22][23][24].…”
Section: Introductionmentioning
confidence: 99%
“…When the momentum of the incident ions in the plasma discharge is high enough, their interaction with the atoms at the surface of the target causes their sputtering and deposition onto a given nearby substrate. This technique operates at room temperature, is highly reproducible, and can be easily scaled up for large area manufacturing at the industrial level [114,115]. MS is an easy-to-use, safe technique, and due to its dry character, it does not generate wastes that are potentially detrimental for the environment [80,116].…”
Section: Magnetron Sputtering Depositionmentioning
confidence: 99%
“…To maximize the performance for water splitting, electrodes must present a high porosity and a large electrochemical active surface area [122]. The OAD-MS technique permits the fabrication of highly porous electrodes consisting of nanocolumns separated by large voids [115,123]. This nanocolumnar microstructure stems from atomic shadowing effects taking place during the electrode growth [124][125][126].…”
Section: Magnetron Sputtering Depositionmentioning
confidence: 99%