1997
DOI: 10.1002/sca.4950190707
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Objective comparison of scanning ion and scanning electron microscope images

Abstract: Summary:Common and different aspects of scanning electron microscope (SEM) and scanning ion microscope (SIM) images are discussed from a viewpoint of interaction between ion or electron beams and specimens. The SIM images [mostly using 30 keV Ga focused ion beam (FIB)] are sensitive to the sample surface as well as to low-voltage SEM images. Reasons for the SIM images as follows: (1) no backscatteredelectron excitation; (2) low yields of backscattered ions; and (3) short ion ranges of 20-40nm, being of the sam… Show more

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Cited by 34 publications
(23 citation statements)
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(19 reference statements)
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“…Although the SE excitation mechanism in the He-SIM is similar to that in the SEM, there are differences between the SIM and SEM, which are closely related to resolution and image fidelity, such as the image contrast in specimen material, surface topography, applied voltage, and so on [2,3]. Therefore, an understanding of the mechanisms and modeling of the image formation and its comparison with the SEM images are a key issue for device applications [4].…”
Section: Introductionmentioning
confidence: 99%
“…Although the SE excitation mechanism in the He-SIM is similar to that in the SEM, there are differences between the SIM and SEM, which are closely related to resolution and image fidelity, such as the image contrast in specimen material, surface topography, applied voltage, and so on [2,3]. Therefore, an understanding of the mechanisms and modeling of the image formation and its comparison with the SEM images are a key issue for device applications [4].…”
Section: Introductionmentioning
confidence: 99%
“…A peculiar contrast arises from SIM as ions are different from electrons in charge, mass, and momentum transfer and consequently both in penetration depth and surface modification (Orloff, 1993;Orloff et al ., 2003;Goldstein et al ., 2003;Giannuzzi and Stevie, 2005). An objective comparison between SEM and SIM is further discussed in the works by Ishitani and Tsuboi (1997) and Ohya and Ishitani (2003).…”
Section: Methodsmentioning
confidence: 99%
“…As-processed and aged devices were observed in the FIB/SEM using electron and ion channelling contrast, the latter being strictly dependent on the grain orientation [11]. Fig.…”
Section: Microstructural Characterizationmentioning
confidence: 98%